Abstract:
A method of fabricating a plasma display panel having a substrate includes the steps of forming an electrode on the substrate, forming a dielectric layer on the substrate including the electrode, forming at least one capillary in the dielectric layer using dry-etching, wherein the capillary and the electrode are separated apart by a portion of the dielectric layer, and sequentially removing the portion of dielectric layer to expose the electrode through the capillary.
Abstract:
A method for fabricating a PDP is disclosed. The method for fabricating a PDP comprising the steps of preparing first and second panels for connecting with each other, forming at least one electrode on the first panel, forming a dielectric layer of PbO on the first panel, sequentially forming Cr and Ni on the PbO layer as a mask material of the PbO layer, performing photolithography and lift-off processes on the Ni/Cr layers to form a mask pattern of Ni/Cr, and etching the PbO layer using the mask pattern of Ni/Cr to form at least one capillary tube within the PbO layer to expose the electrode.
Abstract:
A method of fabricating a plasma display panel having a substrate (41) includes the steps of forming an electrode (42) on the substrate (41), forming a dielectric layer (43) on the substrate (41) including the electrode (42), forming at least one capillary (44) in the dielectric layer (43) using dry-etching, wherein the capillary (44) and the electrode (42) are separated apart by a portion of the dielectric layer (43), and sequentially removing the portion of dielectric layer (43) to expose the electrode (42) through the capillary (45).