Abstract:
A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of an amphoteric surfactant and a substantially water-soluble organo-lithium salt, e.g., lithium naphthenate, lithium benzoate, lithium ricinoleate, etc. The novel developers quickly remove non-image areas of the plate and yet do not detrimentally dissolve the image areas of the plate.
Abstract:
A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of an amphoteric surfactant. The novel developers quickly remove non-image areas of the plate and yet do not detrimentally dissolve the image areas of the plate.
Abstract:
A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of an amphoteric surfactant. The novel developers quickly remove non-image areas of the plate and yet do not detrimentally dissolve the image areas of the plate.