公开(公告)号：WO2015050582A3

公开(公告)日：2015-04-09

申请号：PCT/US2014/038798

申请日：2014-05-20

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： SASAGAWA, Teruo ,  GIRI, Sandeep Kumar ,  LONDERGAN, Ana Rangelova ,  CHIANG, Shih-Chou

IPC: C23C16/54 ,  B05C11/10 ,  C23C16/455 ,  C23C16/458 ,  C23C16/40 ,  B05D1/00

Abstract: This disclosure provides systems, methods and apparatus for processing multiple substrates in a processing tool. An apparatus for processing substrates can include a process chamber, a common reactant source, and a common exhaust pump. The process chamber can be configured to process multiple substrates. The process chamber can include a plurality of stacked individual subchambers. Each subchamber can be configured to process one substrate. The common reactant source can be configured to provide reactant to each of the subchambers in parallel. The common exhaust pump can be connected to each of the subchambers.