BIPOLAR TRANSISTOR
    10.
    发明专利

    公开(公告)号:CA1024267A

    公开(公告)日:1978-01-10

    申请号:CA222356

    申请日:1975-03-18

    Applicant: RCA CORP

    Abstract: A planar bipolar transistor is made by the successive ion implantations of selected atoms into selected regions of a layer of doped single-crystal silicon on an insulating substrate, such as sapphire or spinel. The silicon layer is epitaxially grown, has a thickness of between 0.5 and 5 mu m, and is formed in two strata of different resistivities. A collector contact well is ion implanted into the upper stratum and annealed to diffuse it into the lower stratum of lower resistivity. The transistor is isolated, as a mesa, on the substrate; and an edge-guard region is ion implanted through the periphery of the mesa, except in the region of the emitter-base junction.

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