DIAGNOSTICS FOR INDUSTRIAL PROCESS CONTROL AND MEASUREMENT SYSTEMS
    1.
    发明申请
    DIAGNOSTICS FOR INDUSTRIAL PROCESS CONTROL AND MEASUREMENT SYSTEMS 审中-公开
    工业过程控制和测量系统诊断

    公开(公告)号:WO2002093280A1

    公开(公告)日:2002-11-21

    申请号:PCT/US2002/014560

    申请日:2002-05-08

    Abstract: A field device (20, 200) includes diagnostic circuitry (36) adapted to measure a characteristic related to a process control and measurement system (10). The measured characteristic is used to provide a diagnostic output indicative of a condition of the process control and measurement system (10). The measured characteristic can be provided to a diagnostic module that operates upon the measured characteristic to predict, or otherwise model, a condition of the process control and measurement system (10).

    Abstract translation: 现场设备(20,200)包括适于测量与过程控制和测量系统(10)相关的特性的诊断电路(36)。 所测量的特性用于提供指示过程控制和测量系统(10)的状况的诊断输出。 测量的特性可以提供给诊断模块,该诊断模块根据所测量的特性来预测或以其他方式模拟过程控制和测量系统(10)的状况。

    MULTIVARIABLE TRANSMITTER
    2.
    发明申请
    MULTIVARIABLE TRANSMITTER 审中-公开
    多功能发射机

    公开(公告)号:WO1995007522A1

    公开(公告)日:1995-03-16

    申请号:PCT/US1994009113

    申请日:1994-08-12

    Applicant: ROSEMOUNT INC.

    CPC classification number: G08C19/02

    Abstract: In this invention, a multivariable transmitter (2) providing an output representative of mass flow has a dual microprocessor structure. The first microprocessor (72) compensates digitized process variables and the second microprocessor (80) computes the mass flow as well as arbitrating communications between the transmitter (2) and a master (88).

    Abstract translation: 在本发明中,提供代表质量流量的输出的多变量发射器(2)具有双微处理器结构。 第一微处理器(72)补偿数字化过程变量,第二微处理器(80)计算质量流量以及仲裁发射机(2)和主机(88)之间的通信。

    DIAGNOSTICS FOR INDUSTRIAL PROCESS CONTROL AND MEASUREMENT SYSTEMS
    3.
    发明授权
    DIAGNOSTICS FOR INDUSTRIAL PROCESS CONTROL AND MEASUREMENT SYSTEMS 有权
    DIAGNOSEFÜRDIE INDUSTRIELLE PROZESSSTEUERUNG UND MESSSYSTEME

    公开(公告)号:EP1390822B1

    公开(公告)日:2005-09-28

    申请号:EP02769691.3

    申请日:2002-05-08

    Abstract: A field device (20, 200) includes diagnostic circuitry (36) adapted to measure a characteristic related to a process control and measurement system (10). The measured characteristic is used to provide a diagnostic output indicative of a condition of the process control and measurement system (10). The measured characteristic can be provided to a diagnostic module that operates upon the measured characteristic to predict, or otherwise model, a condition of the process control and measurement system (10).

    Abstract translation: 现场设备包括适于测量与过程控制和测量系统相关的特性的诊断电路。 测量的特性用于提供指示过程控制和测量系统的状况的诊断输出。 测量的特性可以提供给诊断模块,该诊断模块根据测量的特性来预测或以其他方式模拟过程控制和测量系统的状况。

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