公开(公告)号：EP1803017A2

公开(公告)日：2007-07-04

申请号：EP05793326.9

申请日：2005-09-08

Applicant: Reflectivity, Inc.

Inventor： PATEL, Satyadev

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: The micromirror device of the present invention comprises a reflective deflectable mirror plate and an addressing electrode provided for deflecting the mirror plate, wherein the addressing electrode is displaced along a direction perpendicular to the length of the hinge such that a portion of the addressing electrode is extended beyond the mirror plate.

公开(公告)号：WO2006001921A2

公开(公告)日：2006-01-05

申请号：PCT/US2005/016732

申请日：2005-05-12

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev ,  RICHARDS, Peter ,  DOAN, Jonathan ,  TARN, Terry

Inventor： PATEL, Satyadev ,  RICHARDS, Peter ,  DOAN, Jonathan ,  TARN, Terry

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  H04N9/3114

Abstract: Disclosed herein a microelectromechanical device having first and second substrates that are bonded together with a gap formed therebetween. A plurality of functional members is disposed within the gap. The two substrates are bonded with a bonding agent that comprises an electrically conductive adhesive material.

Abstract translation: 本文公开了一种具有第一和第二基板的微机电装置，其间形成有间隙结合在一起。 多个功能构件设置在间隙内。 两个基板与包含导电粘合剂材料的粘结剂粘合。

公开(公告)号：WO2005045889A2

公开(公告)日：2005-05-19

申请号：PCT/US2004/033773

申请日：2004-10-12

Applicant: REFLECTIVITY, INC. ,  HUIBERS, Andrew ,  PATEL, Satyadev

Inventor： HUIBERS, Andrew ,  PATEL, Satyadev

IPC: H01L

CPC classification number: G02B26/0841

Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

Abstract translation: 在显示系统中使用的空间光调制器的微镜阵列的微反射镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

公开(公告)号：WO2003105198A1

公开(公告)日：2003-12-18

申请号：PCT/US2003/018741

申请日：2003-06-11

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev ,  HUIBERS, Andrew ,  RICHARDS, Peter ,  SHI, Hongqin ,  CHIANG, Steve ,  DUBOC, Robert, Jr. ,  GROBELNY, Thomas ,  DEHLINGER, Dietrich ,  SUN, Anthony ,  CHEN, Hung, Nan

Inventor： PATEL, Satyadev ,  HUIBERS, Andrew ,  RICHARDS, Peter ,  SHI, Hongqin ,  CHIANG, Steve ,  DUBOC, Robert, Jr. ,  GROBELNY, Thomas ,  DEHLINGER, Dietrich ,  SUN, Anthony ,  CHEN, Hung, Nan

IPC: H01L21/00

CPC classification number: B81B7/0077 ,  B81B2201/042 ,  B81C1/00269 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  G02B26/0841 ,  H01L24/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1461 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.

Abstract translation: 公开了投影系统，空间光调制器和用于形成MEMS器件的方法。 空间光调制器可以具有与包括微镜阵列的基板中的一个结合在一起的两个基板。 在一个或两个晶片上沉积吸气剂材料和/或固体或液体润滑剂之后，两个基底可以在晶片级粘结。 如果需要，晶片可以密封在一起，并且两个基板之间的压力可以低于大气。

公开(公告)号：WO2006033860A2

公开(公告)日：2006-03-30

申请号：PCT/US2005/032182

申请日：2005-09-08

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev

Inventor： PATEL, Satyadev

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: The micromirror device of the present invention comprises a reflective deflectable mirror plate and an addressing electrode provided for deflecting the mirror plate, wherein the addressing electrode is displaced along a direction perpendicular to the length of the hinge such that a portion of the addressing electrode is extended beyond the mirror plate.

Abstract translation: 本发明的微反射镜装置包括反射偏转镜板和用于偏转镜板的寻址电极，其中寻址电极沿垂直于铰链长度的方向移位，使得寻址电极的一部分延伸 超越镜面板。

公开(公告)号：EP1315993A2

公开(公告)日：2003-06-04

申请号：EP01959466.2

申请日：2001-08-03

Applicant: Reflectivity Inc.

Inventor： HUIBERS, Andrew, G. ,  ILKOV, Fedor ,  PATEL, Satyadev ,  RICHARDS, Peter, W. ,  STOCKTON, John

IPC: G02B26/00 ,  G03B21/28

CPC classification number: G02B26/0841 ,  B81B7/0067 ,  G02B26/0833 ,  G03B21/28 ,  G03F7/70291 ,  H04N5/7458

Abstract: Micromirrors are provided which are not rectangular in order to minimize light diffraction along a direction of switching and into the acceptance cone of collection optics (115). A light source (114) is placed orthogonal to rows and columns of an array (94) though not orthogonal to any substantial portion of the sides of the micromirrors in the array. The micromirrors of the present invention result in an improved contrast ratio and the light source position results in a more compact system. The micromirrors have the ability to pivot in opposite direction to on and off positions where the movement to the on position is greater than the movement to the off position.

公开(公告)号：EP1803017B1

公开(公告)日：2019-05-15

申请号：EP05793326.9

申请日：2005-09-08

Applicant: Reflectivity, Inc.

Inventor： PATEL, Satyadev

IPC: G02B26/08 ,  G02B26/00

公开(公告)号：EP1313896A2

公开(公告)日：2003-05-28

申请号：EP01973670.1

申请日：2001-08-28

Applicant: Reflectivity Inc.

Inventor： PATEL, Satyadev ,  SCHAADT, Gregory P. ,  MACDONALD, Douglas B. ,  MACDONALD, Niles K.

IPC: C25F3/12

CPC classification number: H01L21/67063 ,  C03C15/00 ,  C03C2218/33 ,  H01L21/67017

Abstract: Processes for the addition or removal of a layer or region from a workpiece (14) material by contact with a process gas, in the manufacture of a microstructure, are enhanced by the use of a recirculation of the process gas. Recirculation is effected by a pump (18) that has no sliding or abrading parts that contact the process gas nor any wet (such as oil) seals or purge gas in the pump (18). Improved processing can be achieved by a process chamber (15) that contains a baffle (16), a perforated plate (17), or both, appropriately situated in the chamber (15) to deflect the incoming process gas and distribute it over the workpiece (14) surface. In certain embodiments, a diluent gas is added to the recirculation loop (36) and continuously recirculated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop (36). Also, cooling of the process gas, etching chamber (15) and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample (14) of microscopic dimensions.