公开(公告)号：JP2005099793A

公开(公告)日：2005-04-14

申请号：JP2004257715

申请日：2004-09-03

Applicant: Reflectivity Inc ,  リフレクティヴィティー, インク.

Inventor： HUIBERS ANDREW G ,  ILKOV FEDOR ,  PATEL SATYADEV ,  RICHARDS PETER W ,  STOCKTON JOHN

IPC: B81B3/00 ,  B81B7/02 ,  B81B7/04 ,  B81C1/00 ,  G02B26/08 ,  G02B27/18 ,  G03B21/00 ,  G03B21/10 ,  H04N3/08 ,  H04N5/74

CPC classification number: G02B26/0841 ,  B81B7/0067 ,  G02B26/0833 ,  G03B21/28 ,  G03F7/70291 ,  H04N5/7458

Abstract: PROBLEM TO BE SOLVED: To minimize diffracted light in a switching direction with respect to a mobile micromirror and a micromirror array in a projection display device or the like. SOLUTION: A micromirror being not rectangular is adopted in order to minimize diffraction of light in the switching direction, namely, diffraction of light to a light receiving cone of a light condensing system. In order to minimize the cost of an irradiation system and the size of a display unit, a light source is arranged perpendicularly to rows (or columns) of an array or perpendicularly to a side of a frame demarcating an effective area of the array. Incident light is not practically perpendicular to side surfaces of individual micromirrors in the array. Perpendicular side surfaces diffract incident light in the direction of micromirror switching. This light diffraction decreases the contrast ratio of the micromirror, and thus an improved and more compact system is obtained. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了使相对于投影显示装置等中的移动微镜和微镜阵列的切换方向的衍射光最小化。 解决方案：采用不是矩形的微镜，以便使切换方向上的光的衍射最小化，即将光衍射到聚光系统的光接收锥。 为了最小化照射系统的成本和显示单元的尺寸，光源垂直于阵列的行（或列）布置或垂直于框架边界排列阵列的有效区域。 入射光实际上并不垂直于阵列中各个微镜的侧表面。 垂直侧面沿微镜切换方向衍射入射光。 该光衍射降低了微反射镜的对比度，从而获得了改进的和更紧凑的系统。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005122145A

公开(公告)日：2005-05-12

申请号：JP2004272332

申请日：2004-09-17

Applicant: Reflectivity Inc ,  リフレクティヴィティー, インク.

Inventor： HUIBERS ANDREW G ,  ILKOV FEDOR ,  PATEL SATYADEV ,  RICHARDS PETER W ,  STOCKTON JOHN

IPC: B81B3/00 ,  B81B7/02 ,  B81B7/04 ,  B81C1/00 ,  G02B26/08 ,  G02B27/18 ,  G03B21/00 ,  G03B21/10 ,  H04N3/08 ,  H04N5/74

CPC classification number: G02B26/0841 ,  B81B7/0067 ,  G02B26/0833 ,  G03B21/28 ,  G03F7/70291 ,  H04N5/7458

Abstract: PROBLEM TO BE SOLVED: To provide micromirrors to minimize light diffraction along the direction of switching and more particularly light diffraction into the acceptance cone of a collection optics. SOLUTION: In the present invention, a light source is placed orthogonal to the rows (or columns) of an array, and/or the light source is placed orthogonal to a side of the frame defining the active area of the array. An incident light beam, though orthogonal to the sides of the active area, is not however, orthogonal to any substantial portion of sides of the individual micromirrors in the array. Orthogonal sides cause incident light to diffract along the direction of micromirror switching, and result in minimum light leakage into 'on' state even if the micromirrors are in the 'off' state to thereby improve a contrast ratio. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供微镜以使沿着切换方向的光衍射最小化，更具体地说，是将光衍射最小化到收集光学器件的接收锥中。 解决方案：在本发明中，将光源放置成与阵列的行（或列）正交，和/或将光源正交于限定阵列的有源区域的框架的侧面。 然而，入射光束虽然正交于有源区域的侧面，但是不是与阵列中的各个微镜的任何相当大部分的侧面正交。 正交侧使得入射光沿着微镜切换的方向衍射，即使微镜处于“关”状态，导致最小的光泄漏到“开”状态，从而提高对比度。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2006178447A

公开(公告)日：2006-07-06

申请号：JP2005353848

申请日：2005-12-07

Applicant: Reflectivity Inc ,  リフレクティヴィティー, インク.

Inventor： HUIBERS ANDREW G ,  ILKOV FEDOR ,  PATEL SATYADEV ,  RICHARDS PETER W ,  STOCKTON JOHN

IPC: G02B26/08 ,  B81B3/00 ,  B81B7/02 ,  B81B7/04 ,  B81C1/00 ,  G02B27/18 ,  G03B21/00 ,  G03B21/10 ,  H04N3/08 ,  H04N5/74

CPC classification number: G02B26/0841 ,  B81B7/0067 ,  G02B26/0833 ,  G03B21/28 ,  G03F7/70291 ,  H04N5/7458

Abstract: PROBLEM TO BE SOLVED: To provide micromirrors which are not rectangular to minimize light diffraction along the direction of switching and more particularly light diffraction into the acceptance cone of a collection optics. SOLUTION: A light source 114 is placed orthogonal to the rows (or columns) of the array, and/or the light source 114 is placed orthogonal to a side of the frame defining the active area 94 of the array. An incident light beam 116, though orthogonal to the sides of the active area, is not substantially orthogonal to any side surface of the individual micromirrors in the array. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供不是矩形的微镜，以使沿着切换方向的光衍射最小化，更具体地说，是将光学衍射更好地聚集到收集光学器件的接收锥体中。 解决方案：将光源114放置成与阵列的行（或列）正交，和/或将光源114正交于限定阵列的有源区域94的框架的侧面。 入射光束116虽然与有源区域的侧面正交，但基本上不与阵列中的各个微镜的任何侧表面正交。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005122146A

公开(公告)日：2005-05-12

申请号：JP2004272333

申请日：2004-09-17

Applicant: Reflectivity Inc ,  リフレクティヴィティー, インク.

Inventor： HUIBERS ANDREW G ,  ILKOV FEDOR ,  PATEL SATYADEV ,  RICHARDS PETER W ,  STOCKTON JOHN

IPC: B81B3/00 ,  B81B7/02 ,  B81B7/04 ,  B81C1/00 ,  G02B26/08 ,  G02B27/18 ,  G03B21/00 ,  G03B21/10 ,  H04N3/08 ,  H04N5/74

CPC classification number: G02B26/0841 ,  B81B7/0067 ,  G02B26/0833 ,  G03B21/28 ,  G03F7/70291 ,  H04N5/7458

Abstract: PROBLEM TO BE SOLVED: To provide micromirrors which are not rectangular to minimize light diffraction along the direction of switching and more particularly light diffraction into the acceptance cone of a collection optics. SOLUTION: A light source is placed orthogonal to the rows (or columns) of the array, and/or the light source is placed orthogonal to a side of the frame defining the active area of the array. An incident light beam, though orthogonal to the sides of the active area, is not however, orthogonal to any substantial portion of sides of the individual micromirrors in the array. This structure and design suppress the light diffraction and improve contrast ratio, and the arrangement of the light source to micromirror array results in a more compact system. The micromirrors pivot in opposite direction to on and off positions, where the movement to the on position is greater than movement to the off position. A package has a window that is not parallel to the substrate upon which the micromirrors are formed. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供不是矩形的微镜，以使沿着切换方向的光衍射最小化，更具体地说，是将光学衍射更好地聚集到收集光学器件的接收锥体中。 解决方案：将光源放置成与阵列的行（或列）正交，和/或将光源正交于限定阵列的有效区域的框架的侧面。 然而，入射光束虽然正交于有源区域的侧面，但是不是与阵列中的各个微镜的任何相当大部分的侧面正交。 这种结构和设计抑制了光衍射并提高了对比度，并且光源与微镜阵列的配置导致了更紧凑的系统。 微反射镜以相对于打开和关闭位置的方向枢转，其中到打开位置的移动大于移动到关闭位置。 封装具有不平行于形成微反射镜的基板的窗口。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：US20030054588A1

公开(公告)日：2003-03-20

申请号：US10005308

申请日：2001-12-03

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Steven S. Chiang

IPC: H01L021/44

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20020197761A1

公开(公告)日：2002-12-26

申请号：US10154150

申请日：2002-05-22

Applicant: REFLECTIVITY, INC.

Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Gregory P. Schaadt ,  Peter J. Heureux

IPC: H01L021/00 ,  H01L021/302 ,  H01L021/461

CPC classification number: B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

Abstract: An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

Abstract translation: 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

公开(公告)号：US20040012838A1

公开(公告)日：2004-01-22

申请号：US10305631

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers

IPC: G02B026/00

CPC classification number: B82Y30/00

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light blocking layer that is preferably a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light blocking layer can be formed as a pattern, such as a grid or strips for blocking light from entering gaps between adjacent micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成MEMS器件的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，其中一个衬底是透光衬底，并且在透光衬底上设置优选为光吸收层的遮光层，以选择性地阻挡光通过衬底。 光阻挡层可以形成为图案，例如用于阻挡光进入相邻微镜之间的间隙的栅格或条带。

公开(公告)号：US20020105729A1

公开(公告)日：2002-08-08

申请号：US10044451

申请日：2002-01-11

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Peter W. Richards ,  Andrew G. Huibers ,  Gregory R. Muir

IPC: G02B027/14

CPC classification number: H04N9/3114 ,  G02B26/008

Abstract: A color wheel is disclosed that has at least one segment that occupies, for a given radius, a percentage of the circumference of the wheel at that radius, which percentage varies continuously or in multiple steps from a radially inward point to a radially outer point on the wheel. In one embodiment, the color wheel has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the transitions from one filter segment to the next is curved or stepped. A color wheel also is disclosed that has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the segments is a higher brightness segment than the others and has sides facing adjacent filter segments that do not lie on the radius of the wheel. A projection system is also disclosed that has a light source, a unique color wheel, a spatial light modulator, and projection optics.

Abstract translation: 公开了一种色轮，其具有至少一个段，对于给定的半径占据在该半径处的轮的圆周的百分比，该百分比从径向内部点到径向外部点连续地或以多个步长 车轮。 在一个实施例中，色轮具有围绕轮的圆周彼此相邻的多个过滤器段，其中从一个过滤器段到下一个的过渡段中的至少一个是弯曲的或阶梯的。 还公开了一种色轮，其具有围绕车轮圆周彼此相邻的多个过滤器段，其中至少一个段是比其它段更高的亮度段，并且具有面向相邻过滤段的侧面，其不位于 轮的半径。 还公开了一种具有光源，独特色轮，空间光调制器和投影光学器件的投影系统。

公开(公告)号：DE69834847T2

公开(公告)日：2007-02-15

申请号：DE69834847

申请日：1998-09-24

Applicant: REFLECTIVITY INC

Inventor： HUIBER GERRIT

IPC: G02B26/00 ,  B81B3/00 ,  G02B26/08

Abstract: A spatial light modulator (12) includes an upper optically transmissive substrate (20) held above a lower substrate (34) containing addressing circuitry (36). One or more electrostatically deflectable elements (48) are suspended by hinges (50) from the upper substrate (20). In operation, individual mirrors (48) are selectively deflected and serve to spatially modulate light (56) that is incident to, and then reflected back through, the upper substrate (20). Motion stops (49) may be attached to the reflective deflectable elements so that the mirror (48) does not snap to the bottom substrate (34). Instead, the motion stop (49) rests against the upper substrate (20) thus limiting the deflection angle of the reflective deflectable elements (48).

公开(公告)号：AU2002303842A1

公开(公告)日：2002-12-03

申请号：AU2002303842

申请日：2002-05-22

Applicant: REFLECTIVITY INC

Inventor： PATEL SATYADEV R ,  SCHAADT GREGORY P ,  HUIBERS ANDREW G ,  HEUREUX PETER J

IPC: B81B3/00 ,  C23F1/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461 ,  B81C5/00 ,  G02B26/08

Abstract: An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.