POLISHING SLURRIES AND METHODS FOR UTILIZING SAME
    3.
    发明申请
    POLISHING SLURRIES AND METHODS FOR UTILIZING SAME 审中-公开
    抛光条纹及使用该条纹的方法

    公开(公告)号:WO2007041199A3

    公开(公告)日:2007-06-28

    申请号:PCT/US2006037825

    申请日:2006-09-29

    Abstract: A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2: 1.

    Abstract translation: 抛光浆包括液体介质和颗粒磨料。 颗粒磨料包括软磨料颗粒,硬磨料颗粒和胶态二氧化硅颗粒,其中该软磨料颗粒具有不大于8的莫氏硬度,并且该硬磨料颗粒具有不小于8的莫氏硬度,并且其中软质 磨粒和硬磨粒以不小于2:1的重量比存在。

    10.
    发明专利
    未知

    公开(公告)号:BRPI0616706A2

    公开(公告)日:2011-06-28

    申请号:BRPI0616706

    申请日:2006-09-29

    Abstract: A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2:1.

Patent Agency Ranking