公开(公告)号：AU5464700A

公开(公告)日：2001-01-02

申请号：AU5464700

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS AND PLASTICS INC

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.