公开(公告)号：US20240216942A1

公开(公告)日：2024-07-04

申请号：US18351705

申请日：2023-07-13

Applicant: SEMES CO., LTD.

Inventor： In Yong JEONG ,  Mu Hyeon LEE

IPC: B05C11/10 ,  B05C5/00 ,  B05C5/02

CPC classification number: B05C11/1036 ,  B05C5/001 ,  B05C5/0208 ,  B05C5/0225 ,  B05C11/1002 ,  B05C11/1042

Abstract: The present disclosure provides an apparatus for supplying chemicals, and an apparatus and a method for treating a substrate. An apparatus for supplying chemicals, according to an embodiment of the present disclosure, includes a storage tank storing the chemicals; a chemical discharge line discharging the chemicals from the storage tank; a circulation line connected to the storage tank and self-circulating the chemicals from the storage tank; a leak determining line connected to the circulation line and supplying gas to the circulation line; and a measurement unit measuring a change in pressure of the gas supplied to the circulation line.