公开(公告)号：WO2006007336A3

公开(公告)日：2009-04-02

申请号：PCT/US2005020277

申请日：2005-06-09

Applicant: SIGMA LAB ARIZONA INC ,  MIKHAEL MICHAEL G ,  YIALIZIS ANGELO ,  ELLWANGER RICHARD E

Inventor： MIKHAEL MICHAEL G ,  YIALIZIS ANGELO ,  ELLWANGER RICHARD E

IPC: H01L21/20 ,  C23C16/30 ,  C23C16/509 ,  H01J37/32 ,  H05H1/24

CPC classification number: C23C16/30 ,  B05D1/62 ,  B05D3/0263 ,  B05D3/067 ,  B05D3/068 ,  C23C16/509 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32532 ,  H01J37/32724 ,  H01J37/32825 ,  H05H1/24

Abstract: A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54,56) separated by a dielectric material (64), a precursor material is mixed with the plasma, and a substrate film or web (14) is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam , infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.

Abstract translation: 在处理空间（58）中通过在大气压下扩散等离子体气体并对其由电介质材料（64）分开的两个金属电极（54,56）产生的电场产生等离子体，混合前体材料 并且通过在等离子体场中的大气压下汽化物质的气相沉积来涂覆基底膜或网（14）。 沉积的前体通过电子束，红外光，可见光或紫外光辐射固化，最适合于沉积的特定材料。 使用等离子体预处理和后处理步骤来增强所得涂覆产品的性能。 通过在等离子体场中雾化和喷射液体前体获得类似的结果。

公开(公告)号：EP1540714A4

公开(公告)日：2007-11-14

申请号：EP03793301

申请日：2003-08-22

Applicant: SIGMA LAB ARIZONA INC

Inventor： MIKHAEL MICHAEL G ,  YIALIZIS ANGELO ,  ELLWANGER RICHARD E

IPC: C23C16/505 ,  C23C16/509 ,  H01L21/20

CPC classification number: C23C16/509

Abstract: A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54, 56) separated by a dielectric material, a vapor precursor is mixed (52) with the plasma, and a substrate material (14) is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The use of vaporized silicon-based materials, fluorine-based materials, chlorine-based materials, and organo-metallic complex materials enables the manufacture of coated substrates with improved properties with regard to moisture-barrier, oxygen-barrier, hardness, scratch- and abrasion-resistance, chemical-resistance, low-friction, hydrophobic and/or oleophobic, hydrophilic, biocide and/or antibacterial, and electrostatic-dissipative/conductive characteristics.