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    ATMOSPHERIC GLOW DISCHARGE WITH CONCURRENT COATING DEPOSITION
    1.
    发明申请
    ATMOSPHERIC GLOW DISCHARGE WITH CONCURRENT COATING DEPOSITION 审中-公开
    大气玻璃放电与同时涂层沉积

    公开(公告)号：WO2006007336A3

    公开(公告)日：2009-04-02

    申请号：PCT/US2005020277

    申请日：2005-06-09

    Applicant: SIGMA LAB ARIZONA INC ,  MIKHAEL MICHAEL G ,  YIALIZIS ANGELO ,  ELLWANGER RICHARD E

    Inventor： MIKHAEL MICHAEL G ,  YIALIZIS ANGELO ,  ELLWANGER RICHARD E

    IPC: H01L21/20 ,  C23C16/30 ,  C23C16/509 ,  H01J37/32 ,  H05H1/24

    CPC classification number: C23C16/30 ,  B05D1/62 ,  B05D3/0263 ,  B05D3/067 ,  B05D3/068 ,  C23C16/509 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32532 ,  H01J37/32724 ,  H01J37/32825 ,  H05H1/24

    Abstract: A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54,56) separated by a dielectric material (64), a precursor material is mixed with the plasma, and a substrate film or web (14) is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam , infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.

    Abstract translation: 在处理空间（58）中通过在大气压下扩散等离子体气体并对其由电介质材料（64）分开的两个金属电极（54,56）产生的电场产生等离子体，混合前体材料 并且通过在等离子体场中的大气压下汽化物质的气相沉积来涂覆基底膜或网（14）。 沉积的前体通过电子束，红外光，可见光或紫外光辐射固化，最适合于沉积的特定材料。 使用等离子体预处理和后处理步骤来增强所得涂覆产品的性能。 通过在等离子体场中雾化和喷射液体前体获得类似的结果。

    CONDUCTIVE FLAKES BY SPUTTERING AND VAPOR DEPOSITION
    2.
    发明申请
    CONDUCTIVE FLAKES BY SPUTTERING AND VAPOR DEPOSITION 审中-公开
    通过溅射和蒸气沉积导致的泡沫

    公开(公告)号：WO2004070733A2

    公开(公告)日：2004-08-19

    申请号：PCT/US2004002738

    申请日：2004-01-30

    Applicant: SIGMA LAB ARIZONA INC ,  MIKHAEL MICHAEL G ,  YIALIZIS ANGELO

    Inventor： MIKHAEL MICHAEL G ,  YIALIZIS ANGELO

    IPC: B22F9/16 ,  C09C1/00 ,  C09D11/00 ,  C23C14/00 ,  H01B1/08 ,  H01B

    CPC classification number: G09C1/00 ,  B22F9/08 ,  B22F9/16 ,  C01P2004/20 ,  C01P2006/40 ,  C09C1/00 ,  C09D7/61 ,  C09D11/52 ,  C23C14/0005 ,  H01B1/08 ,  Y10T428/256

    Abstract: A release agent is flash evaporated and deposited onto a support substrate (64) under conventional vapor-deposition conditions and a conductive metal oxide, such as ITO, is subsequently sputtered or deposited by reactive electron beam onto the resulting release layer (60) in the same process chamber (10) to form a very thin film of conductive material (62). The resulting multilayer product is separated from the support substrate (64), crushed to brake up the metal-oxide film into flakes (70), and heated or mixed in a solvent to separate the soluble release layer (60) from the metallic flakes (70). Thus, by judiciously controlling the deposition of the ITO on the release layer, transparent flakes (70) may be obtained with the desired optical and physical characteristics.

    Abstract translation: 在常规的气相沉积条件下，将释放剂快速蒸发并沉积到支撑衬底（64）上，随后通过反应性电子束将导电金属氧化物（例如ITO）溅射或沉积到所得释放层（60）上 相同的处理室（10）以形成非常薄的导电材料（62）。 将得到的多层产品与支撑基板（64）分离，粉碎以将金属氧化物膜制成薄片（70），并在溶剂中加热或混合，以将可溶性剥离层（60）与金属薄片（ 70）。 因此，通过明智地控制ITO在剥离层上的沉积，可以获得具有期望的光学和物理特性的透明薄片（70）。

    LARGE-AREA ELECTROLUMINESCENT LIGHT-EMITTING DEVICES
    5.
    发明申请
    LARGE-AREA ELECTROLUMINESCENT LIGHT-EMITTING DEVICES 审中-公开
    大面积电致发光设备

    公开(公告)号：WO2005120136A3

    公开(公告)日：2006-12-28

    申请号：PCT/US2005018438

    申请日：2005-05-25

    Applicant: SIGMA LAB ARIZONA INC ,  MIKHAEL MICHAEL G ,  YIALIZIS ANGELO

    Inventor： MIKHAEL MICHAEL G ,  YIALIZIS ANGELO

    IPC: B05D5/12 ,  A41H19/00 ,  A41H37/00 ,  B05D3/00 ,  B05D3/06 ,  C08F2/46 ,  C08F2/54 ,  C08J7/18 ,  G21H5/00 ,  H05B33/10 ,  H05B33/22

    CPC classification number: H05B33/22 ,  H05B33/10

    Abstract: An electroluminescent light-emitting device is manufactured in a semi-continuous process (80, 40, 64) using vapor deposition technology to reduce the thickness of the dielectric layers (72, 52). The phosphor (34), dielectric (52) and electrode (58) layers are deposited sequentially on a flexible web substrate (30), preferably PET (14) coated with conductive ITO (12), which is passed through the deposition sections (74, 32, 54, 82, 84) on a continuous basis. By depositing the dielectric layers in vacuum (50), very thin layers are possible, which yields increased transparency and electrical capacitance. Accordingly the resulting multi-layer structure is suitable for the manufacture of large-area EL devices.

    Abstract translation: 使用气相沉积技术以半连续工艺（80,40,64）制造电致发光发光器件，以减小电介质层（72,52）的厚度。 荧光体（34），电介质（52）和电极（58）层依次沉积在柔性卷材基材（30）上，优选涂覆有导电ITO（12）的PET（14），其通过沉积部分 ，32,54,82,84）。 通过在真空（50）中沉积电介质层，可以实现非常薄的层，这增加了透明度和电容。 因此，所得到的多层结构适用于大面积EL器件的制造。

    BARRIER COATINGS PRODUCED BY ATMOSPHERIC GLOW DISCHARGE
    10.
    发明公开
    BARRIER COATINGS PRODUCED BY ATMOSPHERIC GLOW DISCHARGE 审中-公开
    大气GL HENTLADUNG生产障涂层

    公开(公告)号：EP1540714A4

    公开(公告)日：2007-11-14

    申请号：EP03793301

    申请日：2003-08-22

    Applicant: SIGMA LAB ARIZONA INC

    Inventor： MIKHAEL MICHAEL G ,  YIALIZIS ANGELO ,  ELLWANGER RICHARD E

    IPC: C23C16/505 ,  C23C16/509 ,  H01L21/20

    CPC classification number: C23C16/509

    Abstract: A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54, 56) separated by a dielectric material, a vapor precursor is mixed (52) with the plasma, and a substrate material (14) is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The use of vaporized silicon-based materials, fluorine-based materials, chlorine-based materials, and organo-metallic complex materials enables the manufacture of coated substrates with improved properties with regard to moisture-barrier, oxygen-barrier, hardness, scratch- and abrasion-resistance, chemical-resistance, low-friction, hydrophobic and/or oleophobic, hydrophilic, biocide and/or antibacterial, and electrostatic-dissipative/conductive characteristics.

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