Diffusion-rate-limited thermal chemical vapor deposition coating

    公开(公告)号:AU2017200337A1

    公开(公告)日:2017-08-10

    申请号:AU2017200337

    申请日:2017-01-18

    Applicant: SILCOTEK CORP

    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species. 107--,,. 115

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