公开(公告)号：WO2012047945A2

公开(公告)日：2012-04-12

申请号：PCT/US2011054835

申请日：2011-10-05

Applicant: SILCOTEK CORP ,  SMITH DAVID A ,  MATTZELA JAMES B ,  SILVIS PAUL H ,  BARONE GARY A ,  HIGGINS MARTIN E

Inventor： SMITH DAVID A ,  MATTZELA JAMES B ,  SILVIS PAUL H ,  BARONE GARY A ,  HIGGINS MARTIN E

IPC: C23C16/02

CPC classification number: C09D5/00 ,  C23C16/0272 ,  C23C16/18 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56 ,  C23C30/00 ,  Y10T428/265 ,  Y10T428/31612 ,  Y10T428/31663

Abstract: A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.

Abstract translation: 公开了一种耐磨涂层，其包括由三官能有机硅烷处理的层。 还公开了一种制品，其具有施加耐磨涂层的表面。 还公开了施加耐磨涂层的方法。 在一些实施方案中，有机硅烷是三甲基硅烷，并且通过化学气相沉积施加耐磨涂层，然后在三甲基硅烷存在下对耐磨涂层进行热处理。

公开(公告)号：ES2859458T3

公开(公告)日：2021-10-04

申请号：ES10771619

申请日：2010-10-26

Applicant: SILCOTEK CORP

Inventor： SMITH DAVID A ,  MATTZELA JAMES B ,  SILVIS PAUL H ,  BARONE GARY A

IPC: C23C16/32 ,  B05D7/24 ,  C23C8/10 ,  C23C16/56

Abstract: Un método (200) de deposición química de vapor térmica, comprendiendo el método (200): la preparación de (202) un sustrato (100) en una cámara de deposición química de vapor; la descomposición térmica (204) de dimetilsilano en la cámara de deposición química de vapor para formar un recubrimiento (102), realizándose la descomposición térmica en ausencia de energías de deposición adicionales, tales como campos de plasma y microondas, y en las siguientes condiciones: - a una presión de entre 6,8948x10-3 MPa (6,8948x10-2 bar (1,0 l.p.c.a.)) y 0,68948 MPa (6,8948 bar (100 l.p.c.a.)), preferentemente a una presión de entre 3,4474x10-2 MPa (3,4474x10-1 bar (5 l.p.c.a.)) y aproximadamente 0,27579 MPa (2,7579 bar (40 l.p.c.a.)); y - a una temperatura de entre 300 °C y 600 °C; y - durante un tiempo de 30 minutos a 24 horas.

公开(公告)号：AU2017200337A1

公开(公告)日：2017-08-10

申请号：AU2017200337

申请日：2017-01-18

Applicant: SILCOTEK CORP

Inventor： VEZZA THOMAS F ,  CONDO STEVEN A ,  DESKEVICH NICHOLAS P ,  MATTZELA JAMES B ,  SILVIS PAUL H

IPC: C23C16/455 ,  C23C16/02 ,  C23C16/24

Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species. 107--,,. 115

公开(公告)号：AU2016253571A1

公开(公告)日：2017-05-25

申请号：AU2016253571

申请日：2016-11-02

Applicant: SILCOTEK CORP

Inventor： YUAN MIN ,  SILVIS PAUL H ,  SMITH DAVID A ,  MATTZELA JAMES B

IPC: C23C16/00

Abstract: THERMAL CHEMICAL VAPOR DEPOSITION SPLIT FUNCTIONALIZATION PROCESS, PRODUCT, AND COATING Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time. -12-