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公开(公告)号:FR2501699A1
公开(公告)日:1982-09-17
申请号:FR8122298
申请日:1981-11-27
Inventor: UEDAIRA SATORU , SATORU UEDAIRA HIDETOSHI SHIMIZU HIDEMASA TAMURA HIROMICHI TAGUCHI HIROSHI YAMANOI ET YOSHIMI MAKINO , SHIMIZU HIDETOSHI , TAMURA HIDEMASA , TAGUCHI HIROMICHI , YAMANOI HIROSHI , MAKINO YOSHIMI
IPC: B29C70/64 , C08J5/16 , C08K3/00 , C08L67/06 , F16C33/20 , G11B15/61 , B29C6/00 , B29C17/12 , G11B15/60
Abstract: A.ORGANE A SURFACE DE GLISSEMENT 20 CONSTITUE EN UN MATERIAU POLYMERE COMPOSITE. B.CARACTERISE EN CE QU'ON ELIMINE LA COUCHE SUPERFICIELLE 20A DE CET ORGANE, DE FACON A METTRE A NU UNE PARTIE DE LA SURFACE D'UNE CHARGE MINERALE GRANULAIRE 20B CONTENUE DANS LA COMPOSITION DU MATERIAU COMPOSITE POLYMERE, CE MATERIAU COMPOSITE CONTENANT PRINCIPALEMENT UNE RESINE POLYESTER INSATUREE. C.DISPOSITION APPLICABLE NOTAMMENT AUX ORGANES DE GUIDAGE A FROTTEMENT DE BANDES MAGNETIQUES.
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公开(公告)号:EP0163739A4
公开(公告)日:1987-10-27
申请号:EP84903994
申请日:1984-11-05
Applicant: SONY CORP
Inventor: UEDAIRA SATORU , SUZUKI MASAYUKI , YAMANOI HIROSHI , TAMURA HIDEMASA
CPC classification number: C01G25/006 , C01P2002/34 , C01P2002/72 , C01P2002/76 , C01P2002/77 , C01P2004/03
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公开(公告)号:CA1201575A
公开(公告)日:1986-03-11
申请号:CA435193
申请日:1983-08-23
Applicant: SONY CORP
Inventor: UEDAIRA SATORU , YAMANOI HIROSHI , TAMURA HIDEMASA
Abstract: A method of manufacturing metal titanate fine powder which is represented as MTiO3 wherein M is one of Ba, Sr and Ca is disclosed which includes the steps of preparing hydrolyzed compound of titanium compound and reacting the hydrolyzed compound of titanium compound with water soluble metal salt of one of Ba, Sr and Ca in an aqueous alkaline solution having pH not less than 13 .
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公开(公告)号:FR2561263A1
公开(公告)日:1985-09-20
申请号:FR8419822
申请日:1984-12-26
Applicant: SONY CORP
Inventor: ASO KOICHI , UEDAIRA SATORU , ITO SHIGEYASU , TAMURA HIDEMASA , MAKINO YOSHIMI
Abstract: a. Amorphous magnetic alloy. b. Characterised in that it comprises 2 to 20 % of ruthenium atoms or of ruthenium atoms and chromium, molybdenum, vanadium, aluminium or manganese atoms, the total of the ruthenium and chromium, molybdenum, vanadium, aluminium or manganese atoms representing between 2 and 20 % of alloy, 10 to 30 atomic % of atoms of at least one element capable of forming an amorphous structure, chosen from phosphorus, carbon, silicon, boron and germanium from 0 to 20 atomic % of cobalt and/or nickel. c. Alloy applicable to the manufacture of magnets for tape recorders and video recorders.
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公开(公告)号:DE3324729A1
公开(公告)日:1984-01-12
申请号:DE3324729
申请日:1983-07-08
Applicant: SONY CORP
Inventor: HAYAKAWA MASATOSHI , ASO KOICHI , UEDAIRA SATORU , OCHIAI YOSHITAKA , MATSUDA HIDEKI , HOTAI KAZUHIDE , HAYASHI KAZUHIKO
Abstract: In a process for heat treating amorphous magnetic alloys by producing a film composed of the amorphous magnetic alloy and heat-treating the film at an elevated temperature below the Curie temperature and the crystallisation temperature of the amorphous magnetic alloy using a first magnetic field and a second magnetic field which are repeatedly applied in an alternating manner, the first magnetic field is applied for a predetermined time in one direction of a principle surface of the amorphous magnetic alloy film and the second magnetic field is applied for a predetermined time in a second direction perpendicular to the first direction in the principle surface of the amorphous magnetic alloy film.
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公开(公告)号:DE3142770A1
公开(公告)日:1982-06-24
申请号:DE3142770
申请日:1981-10-28
Applicant: SONY CORP
Inventor: MAKINO YOSHIMI , OCHIAI YOSHITAKA , UEDAIRA SATORU , HOTAI KAZUHIDE , ASO KOICHI , HAYAKAWA MASATOSHI
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公开(公告)号:CA1086986A
公开(公告)日:1980-10-07
申请号:CA310895
申请日:1978-09-08
Applicant: SONY CORP
Inventor: ASO KOICHI , UEDAIRA SATORU , ITO SHIGEYASU , TAMURA HIDEMASA , MAKINO YOSHIMI
Abstract: An amorphous magentic alloy consists of 2 to 20 at % (atomic percent) of ruthenium atoms; 10 to 30 at% of atoms of at least one amorphous forming element selected from the group of phosphous, carbon, silicon, boron and germanium; and iron atoms as the predominant component of the residual.
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公开(公告)号:DE3484201D1
公开(公告)日:1991-04-04
申请号:DE3484201
申请日:1984-11-05
Applicant: SONY CORP
Inventor: UEDAIRA SATORU , SUZUKI MASAYUKI , YAMANOI HIROSHI , TAMURA HIDEMASA
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公开(公告)号:DE3376481D1
公开(公告)日:1988-06-09
申请号:DE3376481
申请日:1983-08-24
Applicant: SONY CORP
Inventor: UEDAIRA SATORU , YAMANOI HIROSHI , TAMURA HIDEMASA
IPC: C01G23/00
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公开(公告)号:CA1217918A
公开(公告)日:1987-02-17
申请号:CA443229
申请日:1983-12-14
Applicant: SONY CORP
Inventor: UEDAIRA SATORU , SUZUKI MASAYUKI , YAMANOI HIROSHI , TAMURA HIDEMASA
Abstract: A method of manufacturing fine powder of BaZrO3 is described, in which a zirconium compound is first hydrolyzed. The hydrolyzed zirconium compound is then reacted with a water-soluble barium compound in a strongly alkaline solution having a ph not lower than 13.6.
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