公开(公告)号：EP2044609B1

公开(公告)日：2011-01-12

申请号：EP07766170.0

申请日：2007-07-06

Applicant: SPP Process Technology Systems UK Limited

Inventor： PROUDFOOT, Gary ,  GEORGE, Christopher, David ,  LIMA, Paulo, Edurado ,  GREEN, Gordon, Robert ,  TROWELL, Robert, Kenneth

IPC: H01J37/305 ,  H01J37/317 ,  C23C14/46 ,  H01J37/08 ,  H01J27/04 ,  H01J27/16 ,  H01J37/20

CPC classification number: C23C14/46 ,  H01J27/18 ,  H01J37/20 ,  H01J37/3178 ,  H01J2237/024 ,  H01J2237/3146

Abstract: This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).

公开(公告)号：EP2044610B1

公开(公告)日：2012-11-28

申请号：EP07733491.0

申请日：2007-07-06

Applicant: SPP Process Technology Systems UK Limited

Inventor： PROUDFOOT, Gary ,  GEORGE, Christopher, David ,  LIMA, Paulo, Eduardo

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/32623