SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS
    2.
    发明申请
    SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS 审中-公开
    亚微米粒子从气体中去除

    公开(公告)号:WO2017196167A1

    公开(公告)日:2017-11-16

    申请号:PCT/NL2017/050287

    申请日:2017-05-09

    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

    Abstract translation: 公开了用于从气流,特别是尿素造粒废气中去除亚微米颗粒的方法和系统,其中使用文丘里喷射器。 一种方法包括使文丘里喷射器中含有亚微米颗粒的气流与注入的高速洗涤液接触以提供泵送作用,其中洗涤液的初始速度为至少2m / s,并且其中洗涤液和 气体流量在0.0005和0.0015(m3 / h)/(m3 / h)之间。 本发明还涉及具有气流处理系统的造粒塔以及改造现有造粒塔的方法,所述气流处理系统包括位于造粒塔顶部的文丘里喷射器。

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