METHOD FOR ATOMIC LAYER DEPOSITION
    1.
    发明申请
    METHOD FOR ATOMIC LAYER DEPOSITION 审中-公开
    原子层沉积的方法

    公开(公告)号:WO2015038919A1

    公开(公告)日:2015-03-19

    申请号:PCT/US2014/055430

    申请日:2014-09-12

    Applicant: STC. UNM

    CPC classification number: C23C16/45525 C23C16/45534 C23C16/46

    Abstract: An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid- phase support to produce a coupled-product.

    Abstract translation: 公开了用于制备多肽的原子层沉积方法。 该方法包括在原子层沉积(ALD)室中提供包含反应性胺单层的固相载体。 固相载体与通过原子层沉积被保护基团取代的第一个被保护的氨基酸接触,其中保护基团与受保护的氨基酸的非侧链氨基键合。 第一个被保护的氨基酸的羧酸基与反应性胺单层反应,从而将第一个被保护的氨基酸与固相载体结合,产生偶联产物。

Patent Agency Ranking