公开(公告)号：EP2515327A1

公开(公告)日：2012-10-24

申请号：EP11305473.8

申请日：2011-04-20

Applicant: STMicroelectronics (Tours) SAS ,  STMicroelectronics Srl

Inventor： Caro, Vincent ,  Rodilosso, Davide

IPC: H01L21/311

CPC classification number: H01G7/06 ,  H01L21/31111 ,  H01L28/55

Abstract: The invention concerns a method for etching a PVD deposited barium strontium titanate (BST) layer, wherein a non-ionic surfactant at a concentration between 0.1 and 1 percent is added to an acid etching solution.

Abstract translation: 本发明涉及一种用于蚀刻PVD沉积的钛酸钡锶（BST）层的方法，其中将0.1％至1％浓度的非离子表面活性剂加入到酸蚀刻溶液中。