MOSFET WITH INTEGRATED FIELD EFFECT RECTIFIER
    1.
    发明公开
    MOSFET WITH INTEGRATED FIELD EFFECT RECTIFIER 审中-公开
    具有集成场效应整流MOSFET

    公开(公告)号:EP2274770A1

    公开(公告)日:2011-01-19

    申请号:EP09739614.7

    申请日:2009-04-28

    CPC classification number: H01L29/7813 H01L29/7803 H01L29/7805

    Abstract: A modified MOSFET structure comprises an integrated field effect rectifier connected between the source and drain of the MOSFET to shunt current during switching of the MOSFET. The integrated FER provides faster switching of the MOSFET due to the absence of injected carriers during switching while also decreasing the level of EMI relative to discrete solutions. The integrated structure of the MOSFET and FER can be fabricated using N-, multi-epitaxial and supertrench technologies, including 0.25µm technology. Self-aligned processing can be used.

    ADJUSTABLE FIELD EFFECT RECTIFIER
    4.
    发明公开

    公开(公告)号:EP3447803A3

    公开(公告)日:2019-06-19

    申请号:EP18190780.9

    申请日:2008-09-25

    Abstract: There is provided an adjustable field effect rectifier comprising an epitaxial layer (420) of a first conductivity with a drain formed on one side of the epitaxial layer (420), a pair of wells (430) of a second conductivity, opposite to the first conductivity, spaced apart from one another, formed in the epitaxial layer (420) opposite the drain, a gate area (405) formed atop the epitaxial layer (420) opposite the drain, an opening (410) through the gate area (405), and a layer (440) of the first conductivity formed in the epitaxial layer (420) under the opening (410) shorted to the gate and the pair of wells, said layer (440) is configured to decrease a resistance of a top layer within the epitaxial layer (420) between the pair of wells (430) and the layer (440).

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