Lateral connection for a via-less thin film resistor and method of forming the same
    2.
    发明公开
    Lateral connection for a via-less thin film resistor and method of forming the same 审中-公开
    用于薄膜电阻横向连接,而通孔及其制造方法

    公开(公告)号:EP2423948A2

    公开(公告)日:2012-02-29

    申请号:EP11178590.3

    申请日:2011-08-24

    Abstract: The present disclosure is directed to an integrated circuit (100) having a substrate (108) and a first and a second interconnect structure (104a,b) over the substrate. Each interconnect structure has a first conductive layer (106) over the substrate and a second conductive layer (124) over the first conductive layer. The integrated circuit also includes a thin film resistor (102) over a portion of the substrate between the first and the second interconnect structure that electrically connects the first conductive layers of the first and second interconnect structures.

    Abstract translation: 本发明涉及在具有基板(108)和第一和第二互连结构(104A,b)在基板的集成电路(100)。 每一个互连结构具有超过基板和在所述第一导电层的第二导电层(124)的第一导电层(106)。 因此,该集成电路包括一个薄膜电阻器(102)在第一和没有导电连接第一和第二互连结构的第一层的第二互连结构之间的衬底的一部分。

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