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1.Method for assessing the effects of plasma treatments on wafers of semicondutor material 失效
Title translation: 的方法来确定的等离子体处理在半导体晶片上的影响公开(公告)号:EP0848428B1
公开(公告)日:2003-04-23
申请号:EP96830625.8
申请日:1996-12-16
Applicant: STMicroelectronics S.r.l.
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2.Process for the manufacture of floating-gate non-volatile memories 失效
Title translation: 一种制备非易失性存储器单元具有浮栅过程公开(公告)号:EP0848422B1
公开(公告)日:2002-03-27
申请号:EP96830624.1
申请日:1996-12-16
Applicant: STMicroelectronics S.r.l.
Inventor: Ghio, Emilio , Alba, Simone , Colognese, Andrea
IPC: H01L21/8247 , H01L21/336
CPC classification number: H01L29/66825 , H01L21/28176
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