Patent search ap:("STMicroelectronics S.r.l.") AND inv:"Maugain Page François"

1.

发明授权
Method for assessing the effects of plasma treatments on wafers of semicondutor material 失效
Title translation: 的方法来确定的等离子体处理在半导体晶片上的影响

公开(公告)号：EP0848428B1

公开(公告)日：2003-04-23

申请号：EP96830625.8

申请日：1996-12-16

Applicant: STMicroelectronics S.r.l.

Inventor： Ghio, Emilio , Alba, Simone , Colognese, Andrea , Maugain, François , Rivera, Giovanni Via V. Alfieri, 8

IPC: H01L29/00 , H01L21/66

CPC classification number: H01L22/20 , H01L22/12

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