Abstract:
A crosspoint memory (10) includes a shared address line (12). The shared address line may be coupled to cells (14, 16) above and below the address line in one embodiment. Voltage biasing may be utilized to select one cell, and to deselect another cell. In this way, each cell may be made up of a selection device and a crosspoint memory element in the same orientation. This may facilitate manufacturing and reduce costs in some embodiments.
Abstract:
In a phase change memory including an ovonic threshold switch, conduction around the chalcogenide layer (22) in the ovonic threshold switch is reduced. In one embodiment, the reduction is achieved by undercutting the conductive layers (18,26) on either side of the chalcogenide layer (22). In another embodiment, an angled ion implantation is carried out which damages the edge regions (18b,16b) of the conductive layers (18,26) that sandwich the chalcogenide layer (22).