Controlled hot-electron writing method for non-volatile memory cells
    1.
    发明公开
    Controlled hot-electron writing method for non-volatile memory cells 失效
    Regisertes Heiss-Elektronen-Schreibverfahrenfürnicht-flüchtigeSpeicherzellen

    公开(公告)号:EP0908895A1

    公开(公告)日:1999-04-14

    申请号:EP97830504.3

    申请日:1997-10-09

    CPC classification number: G11C16/10 G11C11/5621 G11C11/5628 G11C16/12

    Abstract: In order to optimise writing of the cell, the latter is written in a condition of equilibrium between the injection current ( I g ) and the displacement current ( C pp V sl ). In this way, during writing, the voltage of the floating gate region ( V fl ) remains constant, as does the drain current and the rise in the threshold voltage. In particular, both for programming and for soft-writing after erasure, the substrate of the cell is biased at a negative voltage ( V sb ) with respect to the source region, and the control gate region of the cell receives a ramp voltage ( V cg ) with a selected predetermined inclination ( V sl ) satisfying an equilibrium condition ( V sl I g,sat /C pp ).

    Abstract translation: 为了优化电池的写入,后者写入注入电流(Ig)和位移电流(CppVsl)之间的平衡状态。 以这种方式,在写入期间,浮动栅极区域(Vfl)的电压保持恒定,漏极电流和阈值电压的上升也保持恒定。 特别地,对于擦除后的编程和软写入,单元的基板相对于源极区域被偏压为负电压(Vsb),并且单元的控制栅极区域接收斜坡电压(Vcg) 具有满足平衡条件(Vs1

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