公开(公告)号：JP2004134738A

公开(公告)日：2004-04-30

申请号：JP2003155020

申请日：2003-05-30

Applicant: Air Products & Chemicals Inc ,  Symyx Technologies Inc ,  エア プロダクツ アンド ケミカルズ インコーポレイテッドAir Products And Chemicals Incorporated ,  シミックス・テクノロジーズ・インコーポレイテッドSymyx Technologies,Inc.

Inventor： KIRNER JOHN FRANCIS ,  MACDOUGALL JAMES EDWARD ,  PETERSON BRIAN KEITH ,  WEIGEL SCOTT JEFFREY ,  DEIS THOMAS ALAN ,  DEVENNEY MARTIN ,  RAMBERG C ERIC ,  CHONDROUDIS KONSTANTINOS ,  CENDAK KEITH

IPC: H01L21/768 ,  C01B33/16 ,  H01B3/12 ,  H01B3/46 ,  H01L21/312 ,  H01L21/316 ,  H01L23/522

CPC classification number: C09D183/04 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/31695 ,  Y10T428/249967 ,  Y10T428/249969 ,  Y10T428/249979

Abstract: PROBLEM TO BE SOLVED: To disclose low-dielectric-constant materials, the improvements of the performances of the films including the same materials, and the manufacturing methods thereof when they are used as interlayer dielectrics in integrated circuits. SOLUTION: These materials are characterized in that their dielectric constants (k) are equal to or smaller than about 3.7, and the standardized wall elastic moduluses (E 0 ') are equal to or larger than about 15 GPa which are derived partially from the dielectric constants of the foregoing materials, and their metal-impurity levels are equal to or smaller than 500 ppm. Also, there are given low-dielectric-constant materials having dielectric constants smaller than about 1.95 and having standardized wall elastic moduluses (E 0 ') larger than about 26 GPa which are derived partially from the dielectric constants of the foregoing materials. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2002055105A

公开(公告)日：2002-02-20

申请号：JP2001138326

申请日：2001-05-09

Applicant: SYMYX TECHNOLOGIES INC

Inventor： BOUSSIE THOMAS R ,  DEVENNEY MARTIN

IPC: G01N31/22 ,  B01J19/00 ,  C07B61/00 ,  C40B40/14 ,  G01N33/53 ,  G01N37/00 ,  G01N33/566

Abstract: PROBLEM TO BE SOLVED: To provide a method of forming a library of polymer materials in a known position and enclosing these materials for characterization processing. SOLUTION: An unsilanizable material having superior wettability is desirably deposited on a silanizable base board in at least 10 regions. Next, this substrate is brought into contact with a material having no wettability, desirably, with an organic silane agent to eliminate the wettability of the substrate, the substrate is desirably silanized, and desirably, the unsilanizable material superior in wettability in the regions is not silanized, the material with superior wettability is additionally, partially or completely removed, at least 10 polymer materials are deposited in these regions, to evaluate characteristics of the materials.

公开(公告)号：AU2003224744A8

公开(公告)日：2003-10-08

申请号：AU2003224744

申请日：2003-03-21

Applicant: SYMYX TECHNOLOGIES INC ,  HONDA MOTOR CO LTD

Inventor： HE TING ,  GIAQUINTA DANIEL M ,  GORER ALEXANDER ,  DEVENNEY MARTIN ,  FUKUDA HIROICHI ,  OYANAGI HIROYUKI ,  FAN QUN ,  URATA KENTA ,  IWASAKI KAZUHIKO ,  STRASSER PETER ,  CHONDROUDIS KONSTANTINOS

IPC: B01J21/18 ,  B01J23/62 ,  B01J23/652 ,  B01J23/89 ,  C22C1/04 ,  C22C5/04 ,  C22C13/00 ,  C22C27/04 ,  H01M4/92 ,  B01J23/42 ,  B01J23/46 ,  B01J23/56 ,  B01J23/72

公开(公告)号：AU2003217382A1

公开(公告)日：2003-09-04

申请号：AU2003217382

申请日：2003-02-12

Applicant: SYMYX TECHNOLOGIES INC ,  HONDA MOTOR CO LTD

Inventor： FUKUDA HIROICHI ,  GOERER ALEXANDER ,  STRASSER PETER ,  DEVENNEY MARTIN ,  FAN QUN ,  CHONDROUDIS KONSTANTINOS ,  GIAQUINTA DANIEL M ,  HE TING ,  OYANAGI HIROYUKI ,  URATA KENTA ,  IWASAKI KAZUHIKO

IPC: B01J23/652 ,  B01J23/89 ,  H01M4/86 ,  H01M4/88 ,  H01M4/90 ,  H01M4/92 ,  H01M4/96 ,  H01M8/00 ,  H01M8/10

公开(公告)号：AU4662097A

公开(公告)日：1998-04-24

申请号：AU4662097

申请日：1997-09-30

Applicant: SYMYX TECHNOLOGIES INC

Inventor： MCFARLAND ERIC ,  DANIELSON EARL ,  DEVENNEY MARTIN ,  WARREN CHRISTOPHER J

IPC: B01J19/00 ,  B01L3/00 ,  B01L3/02 ,  C25D5/02 ,  C40B30/08 ,  C40B40/14 ,  C40B40/18 ,  C40B50/14 ,  C40B60/14 ,  H01F41/34 ,  C25D17/00

Abstract: Methods and apparatus are provided for the preparation of a substrate having an array of diverse materials, the materials being deposited at spatially addressable, predefined regions. In particular, potential masking systems are provided which generate spatially and temporally varying electric, magnetic and chemical potentials across a substrate. These varying potentials are used to deposit components of source materials onto a substrate in a combinatorial fashion, thus creating arrays of materials that differ slightly in chemical composition, concentration, stoichiometry, and/or thickness. The diverse materials may be organized in discrete arrays, or they may vary continuously over the surface of the substrate. The shape of the potential allows the determination of the composition of the resulting materials at all locations on the substrate.

公开(公告)号：DE60044254D1

公开(公告)日：2010-06-02

申请号：DE60044254

申请日：2000-06-19

Applicant: AGFA HEALTHCARE NV ,  SYMYX TECHNOLOGIES INC

Inventor： DEVENNEY MARTIN ,  REAVES CASPER ,  LEBLANS PAUL ,  STRUYE LUC

IPC: G01J3/443 ,  H01J9/22 ,  A61B6/00 ,  C01F17/00 ,  C09K3/00 ,  C09K11/00 ,  C09K11/08 ,  C09K11/55 ,  C09K11/61 ,  C09K11/85 ,  C23C14/06 ,  C23C16/30 ,  G01N23/04 ,  G01T1/00 ,  G01T1/105 ,  G01T1/202 ,  G01T1/29 ,  G01T7/00 ,  G03B42/02 ,  G03B42/08 ,  G03C5/16 ,  G06T1/00 ,  G11B7/135 ,  G21K4/00 ,  H01L31/09 ,  H04N1/04 ,  H04N1/113

Abstract: A CsX:Eu phosphor produced by heating a cesium halide with a Europium compound containing one or more halides selected from the group consisting of F, Cl, Br and I. Preferably the Europium compound is selected from the group consisting of EuX'2, and EuX'3 and EuX', X' being one or more halides selected from the group consisting of F, Cl, Br and I. The invention also includes novel phosphors having properties inherent to the manufacturing process as well as other phosphors containing a mixture of Br and Cl in the cesium halide, europium doped phosphor.A method for preparing a binderless phosphor screen using these phosphors and a method for recording and reproducing an X-ray image using such screens are also disclosed.

公开(公告)号：DE60317881T2

公开(公告)日：2008-03-20

申请号：DE60317881

申请日：2003-02-27

Applicant: SYMYX TECHNOLOGIES INC ,  HONDA MOTOR CO LTD

Inventor： STRASSER PETER ,  GORER ALEXANDER ,  DEVENNEY MARTIN ,  HE TING ,  OYANAGI HIROYUKI ,  FAN QUN ,  CHONDROUDIS KONSTANTINOS ,  GIAQUINTA DANIEL M ,  URATA KENTA ,  IWASAKI KAZUHIKO ,  FUKUDA HIROICHI

IPC: H01M4/92 ,  B01J21/18 ,  B01J23/40 ,  B01J23/656 ,  B01J23/89 ,  C22C5/04 ,  H01M4/86 ,  H01M4/88 ,  H01M8/06 ,  H01M8/10 ,  H01M8/22

Abstract: An improved metal alloy composition for a fuel cell catalyst containing platinum, nickel, and manganese or iron.

公开(公告)号：DE60317881D1

公开(公告)日：2008-01-17

申请号：DE60317881

申请日：2003-02-27

Applicant: SYMYX TECHNOLOGIES INC ,  HONDA MOTOR CO LTD

Inventor： STRASSER PETER ,  GORER ALEXANDER ,  DEVENNEY MARTIN ,  HE TING ,  OYANAGI HIROYUKI ,  FAN QUN ,  CHONDROUDIS KONSTANTINOS ,  GIAQUINTA DANIEL M ,  URATA KENTA ,  IWASAKI KAZUHIKO ,  FUKUDA HIROICHI

IPC: H01M4/92 ,  B01J21/18 ,  B01J23/40 ,  B01J23/656 ,  B01J23/89 ,  C22C5/04 ,  H01M4/86 ,  H01M4/88 ,  H01M8/06 ,  H01M8/10 ,  H01M8/22

Abstract: An improved metal alloy composition for a fuel cell catalyst containing platinum, nickel, and manganese or iron.

公开(公告)号：AU2003303302A8

公开(公告)日：2004-09-06

申请号：AU2003303302

申请日：2003-05-20

Applicant: SYMYX TECHNOLOGIES INC

Inventor： CHONDROUDIS KONSTANTINOS ,  WANG XUEJUN ,  FAN QUN ,  DEVENNEY MARTIN ,  RAMBERG ERIC C ,  CENDAK KEITH ,  NGUYEN SUM

IPC: B01J19/00 ,  B05B12/14 ,  B05C11/08 ,  B05D1/00 ,  B05D3/02 ,  C40B30/08 ,  C40B40/18 ,  C40B50/14 ,  C40B60/14 ,  G01N1/28 ,  B05C11/06

公开(公告)号：AT268735T

公开(公告)日：2004-06-15

申请号：AT99949737

申请日：1999-09-17

Applicant: SYMYX TECHNOLOGIES INC

Inventor： GIAQUINTA DANIEL ,  DEVENNEY MARTIN ,  HALL KEITH ANTHONY ,  GOLDWASSER ISY

IPC: B01J19/00 ,  C01B13/18 ,  C07B61/00 ,  C09K11/08 ,  C40B40/18 ,  C40B50/08 ,  C40B60/14 ,  C01F11/02 ,  C01F17/00 ,  C04B35/01 ,  C04B35/622 ,  C23C14/04 ,  C23C16/04

Abstract: This invention relates to a method to characterize an array of polymeric materials comprising: depositing unsilanizable material onto a silanizable substrate in at least 10 regions, thereafter contacting the substrate with an organosilane agent thereby silanizing the substrate but not the unsilanizable material in said regions, optionally, partially or completely removing the unsilanizable material, depositing at least 10 polymeric materials onto said regions, and characterizing the materials. This invention also relates to method for forming an array of polymeric materials to be characterized onto a substrate comprising: (a) selecting ten or more polymers, (b) dissolving or suspending each polymer in a separate liquid, and (c) depositing a uniform amount of each of the ten or more polymer containing liquids onto a substrate in individual hydrophilic and/or hydrophobic regions.