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公开(公告)号:JP2004134738A
公开(公告)日:2004-04-30
申请号:JP2003155020
申请日:2003-05-30
Applicant: Air Products & Chemicals Inc , Symyx Technologies Inc , エア プロダクツ アンド ケミカルズ インコーポレイテッドAir Products And Chemicals Incorporated , シミックス・テクノロジーズ・インコーポレイテッドSymyx Technologies,Inc.
Inventor: KIRNER JOHN FRANCIS , MACDOUGALL JAMES EDWARD , PETERSON BRIAN KEITH , WEIGEL SCOTT JEFFREY , DEIS THOMAS ALAN , DEVENNEY MARTIN , RAMBERG C ERIC , CHONDROUDIS KONSTANTINOS , CENDAK KEITH
IPC: H01L21/768 , C01B33/16 , H01B3/12 , H01B3/46 , H01L21/312 , H01L21/316 , H01L23/522
CPC classification number: C09D183/04 , H01L21/02126 , H01L21/02203 , H01L21/02282 , H01L21/31695 , Y10T428/249967 , Y10T428/249969 , Y10T428/249979
Abstract: PROBLEM TO BE SOLVED: To disclose low-dielectric-constant materials, the improvements of the performances of the films including the same materials, and the manufacturing methods thereof when they are used as interlayer dielectrics in integrated circuits. SOLUTION: These materials are characterized in that their dielectric constants (k) are equal to or smaller than about 3.7, and the standardized wall elastic moduluses (E 0 ') are equal to or larger than about 15 GPa which are derived partially from the dielectric constants of the foregoing materials, and their metal-impurity levels are equal to or smaller than 500 ppm. Also, there are given low-dielectric-constant materials having dielectric constants smaller than about 1.95 and having standardized wall elastic moduluses (E 0 ') larger than about 26 GPa which are derived partially from the dielectric constants of the foregoing materials. COPYRIGHT: (C)2004,JPO
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公开(公告)号:AU2003303302A8
公开(公告)日:2004-09-06
申请号:AU2003303302
申请日:2003-05-20
Applicant: SYMYX TECHNOLOGIES INC
Inventor: CHONDROUDIS KONSTANTINOS , WANG XUEJUN , FAN QUN , DEVENNEY MARTIN , RAMBERG ERIC C , CENDAK KEITH , NGUYEN SUM
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公开(公告)号:AU2003303302A1
公开(公告)日:2004-09-06
申请号:AU2003303302
申请日:2003-05-20
Applicant: SYMYX TECHNOLOGIES INC
Inventor: RAMBERG ERIC C , DEVENNEY MARTIN , CENDAK KEITH , NGUYEN SUM , FAN QUN , WANG XUEJUN , CHONDROUDIS KONSTANTINOS
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公开(公告)号:WO2004073048A3
公开(公告)日:2005-02-17
申请号:PCT/US0315952
申请日:2003-05-20
Applicant: SYMYX TECHNOLOGIES INC
Inventor: CHONDROUDIS KONSTANTINOS , RAMBERG ERIC C , DEVENNEY MARTIN , CENDAK KEITH , NGUYEN SUM , FAN QUN , WANG XUEJUN
IPC: B01J19/00 , B05B12/14 , B05C11/08 , B05D1/00 , B05D3/02 , C40B30/08 , C40B40/18 , C40B50/14 , C40B60/14 , G01N1/28 , B05C11/06
CPC classification number: B82Y30/00 , B01J19/0046 , B01J2219/0036 , B01J2219/00364 , B01J2219/00387 , B01J2219/00421 , B01J2219/00443 , B01J2219/00484 , B01J2219/00488 , B01J2219/00495 , B01J2219/00536 , B01J2219/00585 , B01J2219/00603 , B01J2219/00659 , B01J2219/00675 , B01J2219/00691 , B01J2219/00702 , B01J2219/00745 , B01J2219/00747 , B01J2219/00756 , B05B12/14 , B05C11/08 , B05D1/002 , B05D3/02 , C40B30/08 , C40B40/18 , C40B50/14 , C40B60/14 , G01N1/2813
Abstract: The present invention is generally directed to a method and an apparatus for forming an array or a plurality of films on the surface of one or more substrates wherein liquid samples, one deposited on the surface of one or more substrates, are subjected to a non-contact spreading force, such as by moving the substrate(s), which is sufficient to cause the samples to spread over the surface(s) to form respective films thereon. In another embodiment, the liquid samples are spread over the surface of one or more substrates using a flow of pressurized gas. Once formed, one or more of the films may be subjected to a screening process to determine or measure a property thereof.
Abstract translation: 本发明一般涉及用于在一个或多个基底的表面上形成阵列或多个膜的方法和装置,其中沉积在一个或多个基底的表面上的液体样品经受非 - 接触扩展力,例如通过移动衬底,其足以使样品在表面上铺展以在其上形成相应的膜。 在另一个实施例中,使用加压气体流将液体样品分布在一个或多个基底的表面上。 一旦形成,可以对一个或多个膜进行筛选过程以确定或测量其性质。
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公开(公告)号:WO2004064181A3
公开(公告)日:2005-05-19
申请号:PCT/US2004000416
申请日:2004-01-09
Applicant: SYMYX TECHNOLOGIES INC , STRASSER PETER , FAN QUN , DEVENNEY MARTIN , GORER ALEXANDER , CENDAK KEITH , CHONDROUDIS KONSTANTINOS , GIAQUINTA DANIEL M
Inventor: STRASSER PETER , FAN QUN , DEVENNEY MARTIN , GORER ALEXANDER , CENDAK KEITH , CHONDROUDIS KONSTANTINOS , GIAQUINTA DANIEL M
CPC classification number: H01M4/926 , H01M4/921 , H01M8/1007
Abstract: An electrocatalyst containing platinum, ruthenium, and cobalt, which is suitable for use in a fuel cell.
Abstract translation: 含有铂,钌和钴的电催化剂,适用于燃料电池。
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