Abstract:
A method of surface treatment, includes: providing a component in a first process chamber; generating fluorine plasma with a remote plasma source connected to the first process chamber; and forming a protective layer on a surface of the component by providing the fluorine plasma to the first process chamber, wherein the protective layer comprises magnesium fluoride, wherein a magnesium content of the component is about 0.5 wt % to about 5.5 wt %, and wherein a thickness of the protective layer is about 100 nm to about 300 nm.
Abstract:
A composition for removing edge beads from a metal-containing resist, and a method of forming patterns including step of removing edge beads using the same are provided. The composition for removing edge beads from a metal-containing resist includes an organic solvent, and a heptagonal ring compound substituted with at least one hydroxyl group (—OH). The heptagonal ring compound has at least two double bonds in the ring.
Abstract:
A condensed-cyclic compound represented by Formula 1A: wherein in Formula 1A, groups, substituents, and variables are the same as defined in the specification.
Abstract:
A condensed-cyclic compound represented by Formula 1A: wherein in Formula 1A, groups, substituents, and variables are the same as defined in the specification.
Abstract:
A condensed-cyclic compound represented by Formula 1A: wherein in Formula 1A, groups, substituents, and variables are the same as defined in the specification.
Abstract:
A condensed-cyclic compound represented by Formula 1A or 1B: wherein in Formulae 1A and 1B, groups, substituents, and variables are the same as defined in the specification.
Abstract:
A condensed cyclic compound represented by Formula 1 wherein in Formula 1, groups X1 to X8, L11, L12, R11, R12 and variables a11, a12, b11, b12 are described in the specification.
Abstract:
A metal-containing photoresist developer composition, and a method of forming patterns including a step of developing using the same are provided. The metal-containing photoresist developer composition includes an organic solvent, and a heptagonal ring compound substituted with at least one hydroxy group (—OH). The heptagonal ring compound has at least two double bonds in the ring.
Abstract:
A condensed-cyclic compound represented by Formula 1A: wherein in Formula 1A, groups, substituents, and variables are the same as defined in the specification.
Abstract:
A carbazole-based compound represented by Formula 1A and 1B: wherein in Formulae 1A and 1B, ring A, groups L1, L2, L11, and L12, substituents R1 to R9 and R11 to R18, and variables a1 to a4 and b1 to b3 are the same as defined in the specification.