公开(公告)号：US20250149311A1

公开(公告)日：2025-05-08

申请号：US18762910

申请日：2024-07-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junho IM ,  Younseon WANG ,  Keonwoo KIM ,  Youngjin NOH ,  Dougyong SUNG ,  Wonhee LEE ,  Sungwook JUNG

IPC: H01J37/32 ,  C23C16/458 ,  H01L21/683

Abstract: A substrate processing apparatus may include a chucking member configured to support a substrate, a base plate configured to support the chucking member, a bonding layer located between the chucking member and the base plate, the bonding layer configured to adhere the chucking member to the base plate, a coating layer on an outer side surface of the bonding layer, and a bonding protective member surrounding an outer side surface of the coating layer, wherein the coating layer conformally covers the outer side surface of the bonding layer.

公开(公告)号：US20250140509A1

公开(公告)日：2025-05-01

申请号：US18631735

申请日：2024-04-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dongwan KIM ,  Minsung KIM ,  Youngseok SONG ,  Jisoo IM ,  Kanghee KIM ,  Younseon WANG ,  Junho IM

IPC: H01J37/02 ,  H01J37/305

Abstract: An ion neutralization module comprising a reflector configured to neutralize an ion, a frame configured to support the reflector, and a conductive adhesive between the reflector and the frame to attach the reflector to the frame.

公开(公告)号：US20240392426A1

公开(公告)日：2024-11-28

申请号：US18430308

申请日：2024-02-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Younseon WANG ,  Jeonghoon NAM ,  Youngkwon KIM ,  Hyunseo CHOI ,  Keonwoo KIM ,  Dougyong SUNG ,  Junho IM

IPC: C23C8/36 ,  C23C8/80 ,  C23C16/44 ,  H01J37/32

Abstract: A method of surface treatment, includes: providing a component in a first process chamber; generating fluorine plasma with a remote plasma source connected to the first process chamber; and forming a protective layer on a surface of the component by providing the fluorine plasma to the first process chamber, wherein the protective layer comprises magnesium fluoride, wherein a magnesium content of the component is about 0.5 wt % to about 5.5 wt %, and wherein a thickness of the protective layer is about 100 nm to about 300 nm.

公开(公告)号：US20250157686A1

公开(公告)日：2025-05-15

申请号：US18810735

申请日：2024-08-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Younseon WANG ,  Siyoung KOH ,  Bonseung GOO ,  Junho IM ,  Dongwan KIM ,  Minsung KIM ,  Jisoo IM

IPC: G21K1/06

Abstract: A reflector for generating neutral beams, the reflector includes a plurality of reflective plates Ion beams from an ion source collide against each of the plurality of reflective plates. The plurality of reflective plates reflect the ion beams and convert the ion beams into neutral beams. A coupling portion disposed between the plurality of reflective plates. Each of the plurality of reflective plates comprises a first surface, a second surface disposed on a first end of the first surface, and a third surface disposed on a second end of the first surface that is opposite to the first end.

公开(公告)号：US20240213071A1

公开(公告)日：2024-06-27

申请号：US18396553

申请日：2023-12-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Junho IM ,  Younseon Wang ,  Yongwoo Kim ,  Taehwa Kim ,  Inseok Seo ,  Kiseok Lee

IPC: H01L21/683 ,  H01J37/32

CPC classification number: H01L21/6833 ,  H01J37/32715

Abstract: An electrostatic chuck includes an electrostatic chuck body having a step portion protruding from a lower end, an adhesive layer disposed on an upper surface of the electrostatic chuck body, a ceramic puck adhered to the adhesive layer and having an edge protruding from the upper surface of the electrostatic chuck body, and a sealant disposed between the step portion and the edge of the ceramic puck and configured to block reaction gas from permeating into the adhesive layer. The sealant includes a coating layer disposed on an external surface thereof, and the coating layer includes a metal oxide including a single rare earth oxide and/or a multilayer heterogeneous metal oxide.