公开(公告)号：WO2006041366A1

公开(公告)日：2006-04-20

申请号：PCT/SE2005/001310

申请日：2005-09-09

Applicant: SANDVIK INTELLECTUAL PROPERTY AB ,  ASTRAND, Maria ,  SELINDER, Torbjörn ,  SJÖSTRAND, Mats

Inventor： ASTRAND, Maria ,  SELINDER, Torbjörn ,  SJÖSTRAND, Mats

IPC: C23C14/06

CPC classification number: C23C30/005 ,  C23C14/0641 ,  C23C14/352 ,  Y10T428/24975 ,  Y10T428/265

Abstract: The present invention relates to a cutting tool comprising a substrate and, a wear resistant coating, said wear resistant coating is composed of one or more layers of refractory compounds of which at least one layer consists of a multilayered MX/LX/MX/LX laminar structure where the alternating layers MX and LX are carbides or nitrides with the elements M and L selected from the group consisting of Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, Al, Si or W and mixtures thereof, wherein the sequence of individual layer thicknesses has no repeat period but essentially aperiodic throughout the entire multilayered structure, and where the individual MX and LX layer thickness is larger than 0.1 ran but the sum of any 10 consecutive layers in the structure is smaller than 300 nm, and the total thickness of said multilayered structure is larger than 0.5 μm but smaller than 20.μm, deposited by PVD- technique, where at least one of MX or LX are electrically isolating, and a method of making such a cutting tool.

Abstract translation: 本发明涉及一种包括基材和耐磨涂层的切削工具，所述耐磨涂层由一层或多层难熔化合物组成，其中至少一层由多层MX / LX / MX / LX层流 结构，其中交替层MX和LX是从由Ti，Nb，Hf，V，Ta，Mo，Zr，Cr，Al，Si或W组成的组中选择的元素M和L的碳化物或氮化物及其混合物，其中 单个层厚度的顺序在整个多层结构中没有重复周期但基本上是非周期性的，并且其中单个MX和LX层厚度大于0.1nm，但是结构中任何10个连续层的总和小于300nm， 并且所述多层结构的总厚度大于0.5μm且小于20.μm，通过PVD技术沉积，其中MX或LX中的至少一个是电绝缘的，以及进行这种切割的方法 湖

公开(公告)号：EP1791986B1

公开(公告)日：2018-05-16

申请号：EP05777956.3

申请日：2005-09-09

Applicant: Sandvik Intellectual Property AB

Inventor： ASTRAND, Maria ,  SELINDER, Torbjörn ,  SJÖSTRAND, Mats

IPC: C23C14/06 ,  C23C14/35 ,  C23C30/00

CPC classification number: C23C30/005 ,  C23C14/0641 ,  C23C14/352 ,  Y10T428/24975 ,  Y10T428/265

Abstract: Method for manufacturing a metal cutting tool comprising depositing a hard and wear resistant refractory coating comprising compounds of which at least one layer consists of a multilayered MX/LX/MX/LX laminar structure where the alternating layers MX and LX are carbides or nitrides with the elements M and L selected from the group consisting of Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, Al, Si or W and mixtures thereof, of which at least one of MX or LX are electrically isolating, and that the other layer(s) comprise(s) wear resistant nitrides, carbides, oxides and/or carbonitrides as known in the art, onto a substrate. Reactive Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) technique using magnetron pairs comprising either one M element target and one L element target or using magnetron pairs with two targets of the same element, arranged so that one target in the magnetron pair acts as anode and the other target acts as cathode and vice versa are used for the deposition.

公开(公告)号：EP1791986A1

公开(公告)日：2007-06-06

申请号：EP05777956.3

申请日：2005-09-09

Applicant: Sandvik Intellectual Property AB

Inventor： ASTRAND, Maria ,  SELINDER, Torbjörn ,  SJÖSTRAND, Mats

IPC: C23C14/06 ,  C23C14/35 ,  C23C30/00

CPC classification number: C23C30/005 ,  C23C14/0641 ,  C23C14/352 ,  Y10T428/24975 ,  Y10T428/265

Abstract: Method for manufacturing a metal cutting tool comprising depositing a hard and wear resistant refractory coating comprising compounds of which at least one layer consists of a multilayered MX/LX/MX/LX laminar structure where the alternating layers MX and LX are carbides or nitrides with the elements M and L selected from the group consisting of Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, Al, Si or W and mixtures thereof, of which at least one of MX or LX are electrically isolating, and that the other layer(s) comprise(s) wear resistant nitrides, carbides, oxides and/or carbonitrides as known in the art, onto a substrate. Reactive Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) technique using magnetron pairs comprising either one M element target and one L element target or using magnetron pairs with two targets of the same element, arranged so that one target in the magnetron pair acts as anode and the other target acts as cathode and vice versa are used for the deposition.