公开(公告)号：US20040071267A1

公开(公告)日：2004-04-15

申请号：US10442544

申请日：2003-05-21

Applicant: Science Research Laboratory, Inc.

Inventor： Jonah Jacob ,  Joseph A. Mangano ,  James Moran ,  Alexander Bykanov ,  Rodney Petr ,  Mordechai Rokni

IPC: H01J035/00

CPC classification number: H05G2/003 ,  H05G2/006 ,  H05H1/48

Abstract: A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode and cathode, for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber, and for feeding Lithium into the discharge chamber.

Abstract translation: 一种致密的等离子体聚焦辐射源，用于使用锂蒸汽产生EUV辐射，并包括同轴设置的阳极和阴极。 本发明包括用于提高EUV辐射生产效率的方法和装置，用于保护，冷却和延长阳极和阴极的寿命，用于保护和屏蔽聚集光学元件不受放电室中的碎片和压力扰动的影响，并将锂进入 放电室。