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公开(公告)号:US20150295133A1
公开(公告)日:2015-10-15
申请号:US14686845
申请日:2015-04-15
Applicant: Sensor Electronic Technology, Inc.
Inventor: Daniel D. Billingsley , Robert M. Kennedy , Wenhong Sun , Rakesh Jain , Maxim S. Shatalov , Alexander Dobrinsky , Michael Shur , Remigijus Gaska
IPC: H01L33/32 , H01L33/06 , H01L21/02 , H01L29/205 , H01L29/778 , H01L29/66 , H01L33/00 , H01L29/20
CPC classification number: H01L33/12 , H01L21/02458 , H01L21/02507 , H01L21/0254 , H01L29/155 , H01L29/2003 , H01L33/0025 , H01L33/007 , H01L33/0075 , H01L33/06 , H01L33/20 , H01L33/24 , H01L33/32 , H01L2224/16225
Abstract: A heterostructure for use in fabricating an optoelectronic device is provided. The heterostructure includes a layer, such as an n-type contact or cladding layer, that includes thin sub-layers inserted therein. The thin sub-layers can be spaced throughout the layer and separated by intervening sub-layers fabricated of the material for the layer. The thin sub-layers can have a distinct composition from the intervening sub-layers, which alters stresses present during growth of the heterostructure.
Abstract translation: 提供了用于制造光电子器件的异质结构。 异质结构包括诸如n型接触或包覆层的层,其包括插入其中的薄子层。 薄的子层可以遍及整个层间隔开,并由用于该层的材料制成的中间子层隔开。 薄的子层可以具有与插入的子层不同的组成,其在异质结构的生长期间改变应力存在。
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公开(公告)号:US09537054B2
公开(公告)日:2017-01-03
申请号:US14686845
申请日:2015-04-15
Applicant: Sensor Electronic Technology, Inc.
Inventor: Daniel D. Billingsley , Robert M. Kennedy , Wenhong Sun , Rakesh Jain , Maxim S. Shatalov , Alexander Dobrinsky , Michael Shur , Remigijus Gaska
CPC classification number: H01L33/12 , H01L21/02458 , H01L21/02507 , H01L21/0254 , H01L29/155 , H01L29/2003 , H01L33/0025 , H01L33/007 , H01L33/0075 , H01L33/06 , H01L33/20 , H01L33/24 , H01L33/32 , H01L2224/16225
Abstract: A heterostructure for use in fabricating an optoelectronic device is provided. The heterostructure includes a layer, such as an n-type contact or cladding layer, that includes thin sub-layers inserted therein. The thin sub-layers can be spaced throughout the layer and separated by intervening sub-layers fabricated of the material for the layer. The thin sub-layers can have a distinct composition from the intervening sub-layers, which alters stresses present during growth of the heterostructure.
Abstract translation: 提供了用于制造光电子器件的异质结构。 异质结构包括诸如n型接触或包覆层的层,其包括插入其中的薄子层。 薄的子层可以遍及整个层间隔开,并由用于该层的材料制成的中间子层隔开。 薄的子层可以具有与插入的子层不同的组成,其在异质结构的生长期间改变应力存在。
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