METHOD TO FABRICATE A MOULD FOR LITHOGRAPHY BY NANO-IMPRINTING
    1.
    发明申请
    METHOD TO FABRICATE A MOULD FOR LITHOGRAPHY BY NANO-IMPRINTING 有权
    用于通过纳米压印来雕刻模具的方法

    公开(公告)号:US20100227018A1

    公开(公告)日:2010-09-09

    申请号:US12715801

    申请日:2010-03-02

    Applicant: Stèfan LANDIS

    Inventor: Stèfan LANDIS

    Abstract: The invention concerns a device forming an imprint mould in three dimensions and comprising at least: a substrate, comprising at least one alternation of layers having at least one part perpendicular to the plane of the substrate, in a first type of material and a second type of material which can be etched selectively relative to each other, a surface topology comprising at least: a) first patterns whose top lies at a first level relative to a surface of the substrate located either side of said topology, these first patterns being in a first type of material, b) and second patterns having at least a second level relative to said surface of the substrate, different from and lower than the first level, and these second patterns being in a second type of material.

    Abstract translation: 本发明涉及一种在三维上形成压印模具的装置,其至少包括:基底,其包括至少一个具有垂直于基底的平面的部分的至少一部分的交替层,第一类型的材料和第二类型 可以相对于彼此选择性蚀刻的材料,表面拓扑结构至少包括:a)第一图案,其顶部相对于位于所​​述拓扑结构的任一侧的所述衬底的表面处于第一水平,所述第一图案位于 第一类型的材料,b)和具有相对于衬底的所述表面至少第二级别的第二图案,不同于和低于第一层级,并且这些第二图案是第二类型的材料。

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