公开(公告)号：EP0500980A1

公开(公告)日：1992-09-02

申请号：EP91102880.1

申请日：1991-02-27

Applicant: TENCOR INSTRUMENTS

Inventor： Neukermans, Armand P. ,  Berger, Josef

IPC: G01B7/34 ,  G01N27/00

CPC classification number: G01Q70/16 ,  G01Q70/10 ,  G01Q70/14 ,  H01L21/30604 ,  H01L21/30608 ,  Y10S438/924

Abstract: A method for fabricating a microtip, cantilevered from a base and having a controllably high aspect ratio, for use in microprobe microscopy to probe variations in materials at the atomic level. A two-layer semiconductor material structure is provided (13), one layer being n type (15) and the other layer being p type (17). A thin pencil of ions (22) of n type is implanted through the n type layer into the p type layer (17), through a small aperture in a mask layer (19) that overlies the n type layer. The p type material is then etched away, leaving the n type ion profile (23) and the n type layer as a cantilevered microtip. The n type semiconductor layer may be replaced by a layer of any material that resists etching by the selected etchant.

Abstract translation: 用于制造从底部悬臂并具有可控高的纵横比的微尖端的方法，用于微探针显微镜以探测原子水平的材料变化。 提供两层半导体材料结构（13），一层为n型（15），另一层为p型（17）。 将n型离子（22）的薄铅通过n型层通过覆盖在n型层上的掩模层（19）中的小孔注入p型层（17）。 然后将p型材料蚀刻掉，留下n型离子轮廓（23）和n型层作为悬臂微尖。 n型半导体层可以由抗蚀刻所选择的蚀刻剂的任何材料的层代替。