Method and apparatus to reduce the leakage rate of a hermetic cavity

    公开(公告)号:US10374621B2

    公开(公告)日:2019-08-06

    申请号:US15366335

    申请日:2016-12-01

    Abstract: A chip scale vapor cell and millimeter wave atomic clock apparatus are disclosed. The chip scale vapor cell includes a first substrate and a second substrate bonded to the first substrate with a bonding material. A primary hermetic cavity includes a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate. A secondary hermetic cavity includes a second bottom wall and second sidewalls formed in the first substrate and a second top wall formed by the lower surface of the second substrate. The secondary hermetic cavity is separate from the primary hermetic cavity and surrounds the perimeter of the primary hermetic cavity. A gas, which can be a dipolar molecular gas, is sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure.

    WAFER SUBSTRATE REMOVAL
    9.
    发明申请
    WAFER SUBSTRATE REMOVAL 有权
    清除基板去除

    公开(公告)号:US20160218175A1

    公开(公告)日:2016-07-28

    申请号:US14701484

    申请日:2015-04-30

    Abstract: A semiconductor device is formed on a semiconductor substrate, including a primary portion of the substrate. An active component of the semiconductor device is disposed in the primary portion of the substrate. An interconnect region is formed on a top surface of the substrate. Semiconductor material is removed from the substrate in an isolation region, which is separate from the primary portion of the substrate; the isolation region extends from the top surface of the substrate to a bottom surface of the substrate. A dielectric replacement material is formed in the isolation region. The semiconductor device further includes an isolated component which is not disposed in the primary portion of the substrate. The dielectric replacement material in the isolation region separates the isolated component from the primary portion of the substrate.

    Abstract translation: 半导体器件形成在包括衬底的主要部分的半导体衬底上。 半导体器件的有源部件设置在基板的主要部分中。 在衬底的顶表面上形成互连区。 在与衬底的主要部分分离的隔离区域中从衬底去除半导体材料; 隔离区域从衬底的顶表面延伸到衬底的底表面。 电介质替代材料形成在隔离区域中。 半导体器件还包括未设置在基板的主要部分中的隔离部件。 隔离区域中的电介质替代材料将隔离的部件与基板的主要部分分离。

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