公开(公告)号：EP0829312B1

公开(公告)日：2003-06-04

申请号：EP97305628.6

申请日：1997-07-25

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Douglas, Monte A. ,  Templeton, Allen C.

IPC: B08B7/00 ,  B08B3/08 ,  H01L21/306

CPC classification number: H01L21/02052 ,  B08B3/08 ,  B08B7/0021 ,  C11D7/50 ,  C11D11/0047 ,  Y10S134/902 ,  Y10S438/902

公开(公告)号：EP0822583A3

公开(公告)日：1998-04-01

申请号：EP97305822.5

申请日：1997-08-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Douglas, Monte A. ,  Templeton, Allen C.

IPC: H01L21/306 ,  B08B3/10

CPC classification number: H01L21/02046 ,  B08B3/08 ,  B08B7/0021 ,  C11D7/50 ,  C11D11/0023 ,  Y10S134/902 ,  Y10S438/902

Abstract: An embodiment of the instant invention is a method of removing inorganic contamination (contamination 104 of FIGUREs 2a-2b) from a layer (layer 102) overlying a substrate (substrate 100), the method comprising the steps of: removing the layer overlying the substrate with at least one removal agent; reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent included in a first supercritical fluid; and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.

Abstract translation: 本发明的一个实施例是一种从覆盖衬底（衬底100）的层（层102）去除无机污染物（图2a-2b的污染物104）的方法，该方法包括以下步骤：去除覆盖衬底 使用至少一种去除剂; 使无机污染物与至少一种转化剂反应，从而转化无机污染物; 通过使所述转化的无机污染物经历至少一种溶剂，所述溶剂包含在第一超临界流体中; 并且其中所述转化的无机污染物比所述无机污染物在溶剂中的溶解度更高。

公开(公告)号：EP0829312A2

公开(公告)日：1998-03-18

申请号：EP97305628.6

申请日：1997-07-25

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Douglas, Monte A. ,  Templeton, Allen C.

IPC: B08B3/08 ,  H01L21/306

CPC classification number: H01L21/02052 ,  B08B3/08 ,  B08B7/0021 ,  C11D7/50 ,  C11D11/0047 ,  Y10S134/902 ,  Y10S438/902

Abstract: An embodiment of the instant invention is a method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO 2 ); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.

Abstract translation: 本发明的一个实施方案是一种从半导体衬底的基本上表面去除无机污染物的方法，该方法包括以下步骤：使无机污染物与至少一种转化剂反应，由此转化无机污染物; 通过使转化的无机污染物经历至少一种溶剂，去除转化的无机污染物，溶剂包含在第一超临界流体（优选超临界CO2）中; 并且其中所述转化的无机污染物比所述无机污染物在溶剂中的溶解度更高。

公开(公告)号：EP0829312A3

公开(公告)日：1999-09-15

申请号：EP97305628.6

申请日：1997-07-25

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Douglas, Monte A. ,  Templeton, Allen C.

IPC: B08B3/08 ,  H01L21/306

CPC classification number: H01L21/02052 ,  B08B3/08 ,  B08B7/0021 ,  C11D7/50 ,  C11D11/0047 ,  Y10S134/902 ,  Y10S438/902

Abstract: An embodiment of the instant invention is a method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO 2 ); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.

Abstract translation: 本发明的一个实施方案是从基本上半导体衬底的表面去除无机污染物的方法，该方法包括以下步骤：使无机污染物与至少一种转化剂反应，从而转化无机污染物; 通过使其转化为至少一种溶剂来除去转化的无机污染物，溶剂包括在第一超临界流体（优选超临界CO 2）中; 并且其中转化的无机污染物比无机污染物更溶于溶剂。

公开(公告)号：EP0822583A2

公开(公告)日：1998-02-04

申请号：EP97305822.5

申请日：1997-08-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Douglas, Monte A. ,  Templeton, Allen C.

IPC: H01L21/306 ,  B08B3/10

CPC classification number: H01L21/02046 ,  B08B3/08 ,  B08B7/0021 ,  C11D7/50 ,  C11D11/0023 ,  Y10S134/902 ,  Y10S438/902

Abstract: An embodiment of the instant invention is a method of removing inorganic contamination (contamination 104 of FIGUREs 2a-2b) from a layer (layer 102) overlying a substrate (substrate 100), the method comprising the steps of: removing the layer overlying the substrate with at least one removal agent; reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent included in a first supercritical fluid; and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.

Abstract translation: 基板的本发明的实施方式是从上覆（衬底100）的层（层102）除去无机污染（图2a-2b的污染104）的方法，该方法包括以下步骤：移除所述层覆盖衬底 与至少一种去除剂; 反应的无机污染与至少一种转换剂中，从而将无机污染; 通过对其进行至少一种溶剂剂去除所述转换后的无机污染，包括在第一超临界流体溶剂剂; 和worin转换后的无机污染在比无机污染溶剂剂更高度可溶。