公开(公告)号：US11651944B2

公开(公告)日：2023-05-16

申请号：US16728550

申请日：2019-12-27

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Kengo Okamura ,  Ken Takahara ,  Takahiro Hayakawa ,  Michihiro Hanami ,  Takayuki Tani

IPC: H01J37/34 ,  C23C14/35 ,  H01J37/32

CPC classification number: H01J37/3405 ,  C23C14/35 ,  H01J37/32568 ,  H01J37/345 ,  H01J2237/20221 ,  H01J2237/332

Abstract: A treatment method performed by a film processing apparatus including: a first discharge electrode unit and a second discharge electrode unit respectively including magnets that form a magnetic field; and an AC power source capable of alternately switching polarities of the first discharge electrode unit and the second discharge electrode unit. In the treatment method, a predetermined surface treatment of a film F is performed by generating a plasma P while alternately switching polarities of the first discharge electrode unit and the second discharge electrode unit by using high-frequency power supplied from the AC power source.