公开(公告)号：CA2010364C

公开(公告)日：1998-10-20

申请号：CA2010364

申请日：1990-02-19

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): (see fig. I) (see fig. II) wherein R1 is H or CH3 and X is selected from: (see fig. III) (see fig. IV) (see fig. V) wherein R1 is H or CH3 and m is an integer of 1 to 4. The thiol methacrylate or acrylate compound gives a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell at processing.

公开(公告)号：DE69005477T2

公开(公告)日：1994-06-01

申请号：DE69005477

申请日：1990-02-21

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): wherein R is H or CH3 and X is selected from: wherein R is H or CH3 and m is an integer of 1 to 4, is polymerizable to obtain a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell on processing.

公开(公告)号：DE3874507T2

公开(公告)日：1993-04-22

申请号：DE3874507

申请日：1988-12-27

Applicant: TORAY INDUSTRIES

Inventor： YAMADA BUNSHI ,  KIMURA MICHIO ,  NOGUCHI YOSHIO

IPC: C07C17/389 ,  C07C25/02 ,  C07C17/38

Abstract: A specific isomer of dichlorocumene is separated from a mixure containing dichlorocumene isomers by adsorptive separation, wherein the zeolite having at least 2 of silica/alumina molar ratio and 0.6 to 1.0 nm of pore size is used as the adsorbent and halogenated benzene or halogenated alkyl benzene is used as desorbent.

公开(公告)号：AT99292T

公开(公告)日：1994-01-15

申请号：AT90301845

申请日：1990-02-21

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): wherein R is H or CH3 and X is selected from: wherein R is H or CH3 and m is an integer of 1 to 4, is polymerizable to obtain a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell on processing.

公开(公告)号：DE68902666D1

公开(公告)日：1992-10-08

申请号：DE68902666

申请日：1989-02-20

Applicant: TORAY INDUSTRIES

Inventor： KANAI TAKASHI ,  KIMURA MICHIO ,  NOGUCHI YOSHIO

IPC: C07C17/38 ,  C07C17/389 ,  C07C25/02

Abstract: By a process for preparing halogenated benzene derivatives comprising distilling or stripping a mixture of the isomers of a halogenated benzene derivative containing a hydrogen halide to remove the hydrogen halide from the isomeric mixture of the halogenated benzene derivative and then contacting with a zeolite adsorbent for selectivity separating the desired isomer of the halogenated benzene derivative it is possible to prevent from degrading the zeolite adsorbent. And it is possible to separate selectively industrially an desired isomer of the halogenated benzene derivative for a long time without reduction of productivity and to separate selectively the desired isomer in high purity.

公开(公告)号：AU629301B2

公开(公告)日：1992-10-01

申请号：AU4995990

申请日：1990-02-21

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04 ,  C08F120/38 ,  C08F220/38

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): wherein R is H or CH3 and X is selected from: wherein R is H or CH3 and m is an integer of 1 to 4, is polymerizable to obtain a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell on processing.

公开(公告)号：AU4995990A

公开(公告)日：1990-08-30

申请号：AU4995990

申请日：1990-02-21

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04 ,  C08F120/38 ,  C08F220/38

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): wherein R is H or CH3 and X is selected from: wherein R is H or CH3 and m is an integer of 1 to 4, is polymerizable to obtain a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell on processing.

公开(公告)号：ES2062331T3

公开(公告)日：1994-12-16

申请号：ES90301845

申请日：1990-02-21

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): wherein R is H or CH3 and X is selected from: wherein R is H or CH3 and m is an integer of 1 to 4, is polymerizable to obtain a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell on processing.

公开(公告)号：DK0384725T3

公开(公告)日：1994-05-09

申请号：DK90301845

申请日：1990-02-21

Applicant: TORAY INDUSTRIES

Inventor： IGUCHI YUICHIRO ,  KIMURA MICHIO ,  OKA KOICHIRO

IPC: C07C327/22 ,  C08F20/38 ,  C08F28/02 ,  G02B1/04

Abstract: A thiol methacrylate or acrylate compound represented by the formula (1) or (2): wherein R is H or CH3 and X is selected from: wherein R is H or CH3 and m is an integer of 1 to 4, is polymerizable to obtain a resin having a high refractive index, a large Abbe number, and a good hardness and heat resistance, and giving little or no smell on processing.

公开(公告)号：DE68902666T2

公开(公告)日：1996-05-02

申请号：DE68902666

申请日：1989-02-20

Applicant: TORAY INDUSTRIES

Inventor： KANAI TAKASHI ,  KIMURA MICHIO ,  NOGUCHI YOSHIO

IPC: C07C17/38 ,  C07C17/389 ,  C07C25/02

Abstract: By a process for preparing halogenated benzene derivatives comprising distilling or stripping a mixture of the isomers of a halogenated benzene derivative containing a hydrogen halide to remove the hydrogen halide from the isomeric mixture of the halogenated benzene derivative and then contacting with a zeolite adsorbent for selectivity separating the desired isomer of the halogenated benzene derivative it is possible to prevent from degrading the zeolite adsorbent. And it is possible to separate selectively industrially an desired isomer of the halogenated benzene derivative for a long time without reduction of productivity and to separate selectively the desired isomer in high purity.