公开(公告)号：JP2000319476A

公开(公告)日：2000-11-21

申请号：JP12676799

申请日：1999-05-07

Applicant: TORAY INDUSTRIES

Inventor： TABATA KENICHI ,  KAWABATA NOBORU ,  OGAWA CHIYUUSHI

IPC: H01J9/02 ,  C08K3/00 ,  C08K3/08 ,  C08K3/40 ,  C08L33/08 ,  H01J11/22 ,  H01J11/34 ,  H01J11/36 ,  H01J11/02

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive paste which makes high-precision pattern formation possible at low cost by compounding inorganic particles with an organic component containing an acrylic copolymer which contains a component having a specified mol.wt. or lower in a specified content. SOLUTION: This paste comprises 50-95 wt.% inorganic particles and 5-50 wt.% organic component containing an acrylic copolymer and has a viscosity of 2,000-200,000 cP. In addition, 0.05-10 wt.% photopolymerization initiator, 0.05-10 wt.% sensitizer, 0.1-30 wt.% antioxidant, 0.001-10 wt.% ultraviolet absorber, etc., are compounded, As the inorganic particles, a glass powder having a 50 wt.% particle size of 1-5 μm and a specific surface area of 1.5-2.5 m2/g can be used, and conductive noble metal (e. Z. Ag) particles, ceramic particles, etc., having an average particle size of 1-5 μm and a specific surface area of 0.1-3 m2/g can also be used. The acrylic copolymer, since it has ethylenically unsaturated groups (e.g. vinyl groups) as side chains and containing 1 wt.% or lower component having a mol.wt. of 1,000 or lower, has a wt. average mol.wt. of 3,000-100,000 and a resin acid value of 60-120 mgKOH/g.