Abstract:
PROBLEM TO BE SOLVED: To provide a pattern formation method for easily controlling orientation of a block copolymer and forming a fine pattern in a shorter time by using microphase separation of the block copolymer.SOLUTION: A pattern formation method includes processes of: forming a heat crosslinkable molecular layer 12 by applying heat crosslinkable molecules onto a substrate 11; forming a photosensitive polymer layer 17 by applying photosensitive polymers onto the heat crosslinkable molecular layer 12; adhering the heat crosslinkable molecular layer 12 and the photosensitive polymer layer 17 by a crosslinking reaction caused by heating; forming a photosensitive polymer pattern having exposed parts and unexposed parts by selectively exposing the photosensitive polymer layer 17; and forming a block copolymer layer 14 including first and second block chains on the photosensitive polymer layer 17, performing micro-phase separation of the block copolymer layer, and forming a pattern of the first and second block chains on the basis of a surface energy of the polymer layer 13.
Abstract:
PROBLEM TO BE SOLVED: To provide a photoelectric conversion element that can absorb light in the long wavelength region in which a conventional photoelectric conversion element cannot absorb.SOLUTION: A photoelectric conversion element includes a photoelectric conversion layer configured by stacking a first metal layer, a semiconductor layer, and a second metal layer. At least one of the first metal layer and the second metal layer is a metal thin film having a plurality of through holes or a metal thin film having a plurality of metal dots spaced apart from one another on the semiconductor layer. Besides, a layer containing an impurity different from the impurities forming a p-layer and an n-layer exists in the photoelectric conversion layer at a location within 5 nm from the metal thin film.
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor light-emitting element having high luminance and a manufacturing method of the same.SOLUTION: The semiconductor light-emitting element according to an embodiment comprises a structure, a first electrode layer and a second electrode layer. The structure includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type and a luminescent layer provided between the first semiconductor layer and the second semiconductor layer. The first electrode layer includes a metal portion, a plurality of first openings and second openings. The first electrode layer is provided on the second semiconductor layer on the side opposite to the first semiconductor layer. The metal portion has a thickness ranging from 10 nanometers to 200 nanometers. The plurality of first openings have circle equivalent diameters ranging from 10 nanometers to 1 micrometer. The second openings have circle equivalent diameters ranging from more than 1 micrometer to 30 micrometers. The first electrode layer is in electrical conduction with the second semiconductor layer and the second electrode layer is in electrical conduction with the first semiconductor layer.
Abstract:
PROBLEM TO BE SOLVED: To provide a pattern formation method capable of forming a pattern having a high orientation and a phase-separated structure on a polymer alloy in a short time.SOLUTION: The pattern formation method includes the steps of: laminating a self-assembled monolayer and a polymer film on a substrate; chemically bonding the polymer film to the self-assembled monolayer with an irradiation of an energy ray, thereby forming a polymer surface layer on the self-assembled monolayer; and forming a polymer alloy having a pattern of a phase-separated structure on the polymer surface layer.
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor light emitting element that has improved luminance characteristics, a lighting device using the same, and a method of manufacturing the semiconductor light emitting element. SOLUTION: The semiconductor light emitting element includes a compound semiconductor layer, a metal electrode layer formed thereupon and having a plurality of openings, and a specified light extraction layer formed further thereupon. The metal electrode layer has the openings of specified size. Further, the light extraction layer is 20 to 70 nm thick to cover the metal electrode layer, or has an uneven structure formed on a surface, a height from a surface of the metal electrode layer to a top of a projection portion being 200 to 700 nm. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a light transmissive electrode achieving both of high generating efficiency and high transmittance, and a method of manufacturing the light transmissive electrode. SOLUTION: A solar cell is equipped with: a photoelectric conversion layer; a light incidence surface side electrode layer; and a counter electrode layer. The light incidence surface side electrode layer is provided with a plurality of openings penetrating the light incidence surface side electrode layer, and a film thickness thereof is in a range of 10 nm or more and 200 nm or less, and an area per one opening of the openings is in a range of 80 nm 2 or more and 0.8 μm 2 or less, and numerical apertures of the openings are in a range of 10% or more and 66% or less, and the whole transmittance is 5% or more at 700 nm. The light incidence surface side electrode layer of this solar cell can be formed by etching using a single particle layer of fine particles and dot patterns of a self-organization of a block copolymer as a mask, and by utilizing a stamper. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a thin film solar cell that can obtain superior conversion efficiency even when a photoelectric conversion layer is made thin in film thickness, and to provide a method of manufacturing the thin film solar cell. SOLUTION: The thin film solar cell 1 includes a substrate 2, the photoelectric conversion layer 4 of ≤1 μm in thickness formed on the substrate 2 and including at least a p-type semiconductor layer 4a, an n-type semiconductor layer 4c, and an i-type semiconductor layer 4b disposed between the p-type semiconductor layer 4a and n-type semiconductor layer 4c, a light incident surface-side electrode layer 5 formed on a light incident surface 4d of the photoelectric conversion layer 4, and a counter electrode layer 3 formed on the surface on the opposite side from the light incident surface 4d, wherein the light incident surface-side electrode layer 5 has a plurality of openings 5a penetrating the light incident surface-side electrode layer 5 and is 10 nm to 200 nm thick, the area of each opening 5a being 80 nm 2 to 0.8 μm 2 , and the numerical aperture as the rate of the total area of the openings 5a to the total area of the light incident surface-side electrode layer 5 being 10 to 66%. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an organic electroluminescent (EL) display or an organic EL illumination device of high efficiency. SOLUTION: This is the organic electroluminescent display equipped with a substrate, a circuit part for pixel driving, and a pixel part aligned in a matrix shape on the substrate. The pixel part is equipped with a light-emitting part including at least one layer or more of organic layers pinched by a first electrode installed at a position near the substrate and a second electrode installed at a position far from the substrate. The second electrode is equipped with a metal electrode layer, and has a plurality of opening parts through which the metal electrode layer penetrates. The metal electrode layer is seamlessly continued between arbitrary two points of a metal site of the metal electrode layer, the diameter of the opening parts is within a range of 10 nm or more and 780 nm or less, the film thickness of the metal electrode layer is within a range of 10 nm or more and 200 nm or less, and in the case distribution of an alignment period of the opening parts is expressed by a radial distribution curve, its half value width is within a range of 5 to 300 nm. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a light transmitting metal electrode having light transmissivity while using highly conductive metal by giving a very fine structure to a metal layer. SOLUTION: The light transmitting metal electrode includes a substrate, and a metal electrode layer having a plurality of opening portions. Selective two points of metal sites in the metal electrode layer continuously run on with each other. In the metal electrode layer, the opening portions are cyclically arrayed to form a plurality of micro domains, and the plurality of micro domains are mutually independent in in-plane arraying directions. The film thickness of the metal electrode layer is within 10-200 nm. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To improve emission efficiency by forming concave-convex structure sized in nanometer on a surface of light-emitting element or the like. SOLUTION: A concave-convex profile of light-emitting element surface is formed so that refractive index may smoothly vary from bulk as follows: namely, (1) an average diameter of the concave-convex profile is smaller than optical wave length; (2) a pitch of the concave-convex profile is equipped with irregularity; and (3) a height and location of bottom of the concave-convex profile are the optical wave length or less, and are made to have a margin from the average value for holding a smooth inclination of the refractive index. Furthermore, these element surfaces can be obtained by: containing block copolymer or graft copolymer; forming thin film on a surface of the light-emitting element using resin composition forming micro phase separation structure in such a manner of self-organization; selectively removing at least one side of the thin film micro phase separation structure formed on the surface; and etching the light-emitting element surface using residual phase as an etching mask. COPYRIGHT: (C)2008,JPO&INPIT