公开(公告)号：JP2001338574A

公开(公告)日：2001-12-07

申请号：JP2000160889

申请日：2000-05-30

Applicant: TOSHIBA CORP

Inventor： GAMO YASUNORI ,  KIMURA SEIJI ,  KOIKE NORIO ,  KOYAIZU SATOKO

IPC: C23F1/00 ,  H01J9/14

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a shadow mask which is capable of reducing nonuniformity and defect of the shadow mask in the manufacture. SOLUTION: This method of manufacturing the shadow mask is as follows. A photoresist film is formed on a long metal thin film P. After development by exposing the resist film via a mask pattern, then the metal thin plate P is cleaned by aqueous solution S of which the major components are nonionic surfactant and a polyphosphoric acid chelating agent. After taking processes of drying and burning the cleaned metal thin plate P, a through hole is formed by etching. Generation of water spots after drying, accompanying remained water drops to the resist film with a mask pattern formed on it, can be prevented. The nonuniformity and defect generated at manufacture of the shadow mask can be reduced.