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公开(公告)号：JPH07140648A
公开(公告)日：1995-06-02
申请号：JP28914793
申请日：1993-11-18
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , MURANAKA KAZUAKI , HASEGAWA MASAZUMI
Abstract: PURPOSE:To form a rugged pattern which is thermally fluidized and cured by the heat treatment after patterning by using a polyvinylphenol as a base polymer to obtain the photosensitive material of limited composition. CONSTITUTION:An alkali-soluble resin is the vinylphenol polymer, a photosensitive agent consists of 1,2-naphthoquinone diazide sulfonic ester, and a thermosetting agent consists of at least one kind of curing agent selected from melamine compds. and >=4-functional alicyclic epoxy compds. and solvent. In this case, the thermosetting agent is selected from at least one kind among the melamine compds. shown by the formula and >=4-functional alicyclic epoxy compds. In the formula, W is NY5Y6(Y5 and Y6 are respectively hydrogen or -CH2OZ, where Z is hydrogen or 1-6C alkyla) or phenyl, and Y1... Y4 are respectively hydrogen of the-CH2OZ.
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公开(公告)号：JPH0695386A
公开(公告)日：1994-04-08
申请号：JP26778792
申请日：1992-09-11
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
Abstract: PURPOSE:To obtain the positive photosensitive material capable of forming a resist pattern high in sensitivity and resolution and the lens by heat treatment after the patterning by using an alkali-soluble resin, a photosensitive agent made of 1,2-naphthoquinonediazido-sulfonate, an epoxy type thermosetting agent, and a solvent to form the photosensitive material. CONSTITUTION:The positive photosensitive material for forming the microlens comprises the alkali-soluble resin, preferably, the resin composed of a structural unit represented by formula I, the photosensitive agent of 1,2-naphthoquinone- diazido-sulfonate, the epoxy type thermosetting agent, and the solvent. In formula I, R1 is H or methyl group, A is OA1 car NA2A3; each of A1-A3 is H, 1-6C alkyl, 6-12C aryl, or 7-12C aralkyl; each of k and m is an integer of >=1; and each of E and m is an integer including 0, thus permitting a material suitable for a condenser microlens to be obtained.
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公开(公告)号：JPH05107767A
公开(公告)日：1993-04-30
申请号：JP29658591
申请日：1991-10-17
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , MATSUMURA KOUSABUROU , HASEGAWA MASAZUMI
IPC: G03F7/004 , G03F7/022 , G03F7/038 , G03F7/11 , H01L21/027 , H01L21/302 , H01L21/3065
Abstract: PURPOSE:To obtain the coating soln. which is good in coatability on level differences, imparts a high degree of flatness to a substrate having ruggedness and has high safety by using specific org. compds. as the essential component of a solvent. CONSTITUTION:The essential components of the solvent of the coating liquid for level difference substrates consisting of a resin and the solvent or the resin, additives and the solvent are formed of the org. compds. expressed by formula I or formula II. In the formulas I, II, R1, denotes hydrogen or-C(=O)CH3; R2, R3, denote a methyl group or ethyl group. The org. compds. expressed by the formulas I, II include a propylene glycol ethyl ether; alkyl alkoxy propionate system, etc. The propylene glycol ethyl ether system in such a case include propylene glycol ethyl ether, etc. Or the alkyl alkoxy propionate system includes ethyl-3-ethoxy propionate, etc.
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公开(公告)号：JPH0240363A
公开(公告)日：1990-02-09
申请号：JP18682888
申请日：1988-07-28
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
IPC: C07D295/18 , C07D207/263 , C07D211/76 , C07D223/08 , C07D225/02
Abstract: NEW MATERIAL:The 1,2-qinonediazide compound of formula I (Ra is H, halogen or 1-4C alkyl; when m is
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公开(公告)号：JPH03223702A
公开(公告)日：1991-10-02
申请号：JP32993790
申请日：1990-11-30
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
Abstract: PURPOSE:To obtain a lens having excellent heat resistance, solvent resistance and transparency after pattern deformation by incorporating such a thermal hardener which imparts the heat resistance and solvent resistance at the time of reheating after the lens formation into the photosensitive material. CONSTITUTION:The thermal hardener which imparts the heat resistance and solvent resistance is incorporated into the positive photosensitive material at the time of forming the lens by the heating treatment of the photosensitive material. Namely, the positive type photosensitive material is constituted of an alkaline-soluble resin, a photosensitive agent and the thermal hardener. A polymer which simultaneously has polystyrene skeleton and carboxylic acid or vinyl phenol polymer or the hydrogen addition product of a novolak resin is used for the resin. This material is usable for resist pattern formation by UV rays, for UV rays, X-rays, etc., is excellent in sensitivity and resolution and can form the condenser lens by executing a baking treatment after the pattern formation. The lens formed in such a manner has a high refractive index and has the excellent transparency, heat resistance and solvent resistance.
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Patent Agency Ranking
公开(公告)号：JPH0247656A
公开(公告)日：1990-02-16
申请号：JP19715688
申请日：1988-08-09
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
IPC: G03F7/023
Abstract: PURPOSE:To improve definition and heat resistance while maintaining sensitivity and process stability by using an alkaline soluble novolak resin contg. a specific co-condensation polymer. CONSTITUTION:The alkaline soluble resin of the positive type photoresist consisting of the alkaline soluble resin and 1,2-quinonediazide photosensitive agent is formed of the novolak resin constituted of the phenol/xylenol co- condensation polymer expressed by the formula I. Pattern formation is executed by using the positive type photoresist. In the formula I, m and n denote positive integer; m/n is 99.9/0.1-0.1/99.9. The sensitivity, definition, heat resistance, and the process stability are improved in this way.
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公开(公告)号：JPH01291240A
公开(公告)日：1989-11-22
申请号：JP11930588
申请日：1988-05-18
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
Abstract: PURPOSE:To improve the resolution and the process stability of the title material, without injuring the sensitivity and the heat resistance of the photoresist material by incorporating a 1,2-quinone diazide compd. composed of a specified compd. in the photoresist material. CONSTITUTION:The 1,2-quinone diazide compd. shown by formula I and an alkali soluble resin are incorporated in the photoresist material. In the formula, R is 1-4 C alkylene group, Ra and Rb are the same or the different with each other, and are each H, OH, 1-4 C alkyl group or halogen atom, D is 1,2-naphthoquinone diazide-4-sulfonyl group, 1,2-naphthoquinone diazide-5-sulfonyl group or 1,2-benzoquinone diazide-4-sulfonyl group, (m) and (n) are each an integer of 0-5, (m+n)>=1. Thus, the excellent performances of the photoresist material such as the sensitivity, the resolution, the heat resistance and a pattern shape of the photoresist, are obtd.
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公开(公告)号：JPH075301A
公开(公告)日：1995-01-10
申请号：JP14337793
申请日：1993-06-15
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
IPC: C08F212/06 , C08F20/02 , C08F212/00 , C08F220/04 , C08F220/06 , C08F222/06 , C08G59/40 , C08L63/00 , G02B1/04 , G02B3/00 , G03C1/695 , G03F7/004 , G03F7/022 , G03F7/039
Abstract: PURPOSE:To form a lens excellent in chemical resistance, etc., by incorporating an alkali-soluble resin, photosensitive agent comprising naphthoquinonediazido sulfonate, specified alicyclic epoxy thermosetting agent, and solvent. CONSTITUTION:This compsn. contains an alkali-soluble resin, photosensitive agent comprising 1,2,-naphthoquinonediazido sulfonate, thermosetting agent comprising a tetra-or higher functional alicyclic epoxy compd., and solvent. The alkali-soluble resin consists of, preferably, sturctural units expressed by formula or II. In formula I, II, R1 is a hydrogen atom or methyl group, R2 and R2 are hydrogen atoms, methyl groups, chlorine etc., A reprents OA1 (wherein A1 is hydrogen or alkyl group of 1-6 cardon number), k, m, z are intergers >1, and 1, n, x, y are integers including 0. By this method, a resist pattern with high sensitivity and high resolution can be obtd., and a lens having large refractive index, excellent transparency in a visible region, heat resistnace and chemical resistance can be obtd.
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公开(公告)号：JPH06347601A
公开(公告)日：1994-12-22
申请号：JP13589593
申请日：1993-06-07
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA , HASEGAWA MASAZUMI
IPC: C08F212/14 , C08F12/00 , C08F20/32 , C08F220/32 , G02B1/04 , G02B3/00 , G03F7/004 , G03F7/022 , G03F7/039
Abstract: PURPOSE:To make it possible to obtain characteristics of excellent transparency, heat resistance, light resistance and chemical resistance in a visible light region by incorporating a specific alkaline-soluble resin, specific photosensitive agent and solvent into a compsn. CONSTITUTION:This photosensitive compsn. contains an alkaline-soluble resin contg. an epoxy group, 1,2-naphthoquinone diazide silfonate as the photosensitive agent and a solvent. The alkaline-soluble resin consists of the structural unit expressed by formula I. In the formula I, R1 denotes hydrogen or methyl group; A denotes, for example formula II; m, n respectively denote >=1 integers. In the formula, R2 denotes a hydrogen or methyl group. The alkaline-soluble resin is preferably a vinyl phenol polymer, vinyl-phenol copolymer, novolak resin which is the polycondensate of phenols and aldehydes or resins formed by epoxy modification of a part of hydroxy groups of the partial hydrolyzates of respective resins.
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公开(公告)号：JPH02205850A
公开(公告)日：1990-08-15
申请号：JP2476489
申请日：1989-02-04
Applicant: TOSOH CORP
Inventor： HASEGAWA MASAZUMI , TSUTSUMI YOSHITAKA , KAMIMURA TERUHISA
IPC: G03F7/022
Abstract: PURPOSE:To improve sensitivity, resolution, heat resistance and process stability by mixing compds. having monohydroxy groups or dihydrox groups with the carrier of 1, 2-quinonediazide compds. to be incorporated into the compsn. CONSTITUTION:This compsn. contains the alkaline soluble novolak resin obtd. by polycondensation of phenols and aldehyde and the 1, 2-quinonediazide compds. The 1, 2-quinonediazide compds. consist of at least one kind of the 1, 2- quinonediazide compds. having a small coefft. of thermal diffusion and at least one kind of the 1, 2-quinonediazide compds. having a large coefft. of thermal diffusion. The positive type photoresist compsn. consisting of the 1, 2- quinonediazide compds. and the alkaline soluble novolak resin is capable of greatly improving resolution and pattern shapes by using the mixture composed of the photosensitive agents which are different in the coefft. of thermal diffusion. This compsn. is suitable for production of semiconductor integrated circuit elements, such as VLSIs.
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