1.
    发明专利
    未知

    公开(公告)号:DE68914140T2

    公开(公告)日:1995-01-12

    申请号:DE68914140

    申请日:1989-10-12

    Applicant: TOSOH CORP

    Abstract: Novel polyacrylic acid ester derivs. of mol. wt. 5000-1,000,000 have repeat units of formula (I), where R and R' = H or CH3; R1 = opt. branched alkyl; A = structural unit derived from a gp. copolymerisable with an acrylic ester, and l = 0.04-1; m = 0-0.96 and n = 0-0.5; provided their sum is 1; further, when m is not more than 0.2, n is 0.01 or less. Prepn. of the polymers is also claimed.

    2.
    发明专利
    未知

    公开(公告)号:DE3678146D1

    公开(公告)日:1991-04-18

    申请号:DE3678146

    申请日:1986-12-23

    Applicant: TOSOH CORP

    Abstract: A halogen-containing polyacrylate derivative having the formula: wherein A is a structural unit derived from a copolymerizable monomer having a double bond; R is wherein each of R1 and R2 is a hydrogen atom or a fluorinated methyl group, provided R1 and R2 are not hydrogen atoms at the same time, and R3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m is from 0 to 2, preferably from 0 to 1.

    5.
    发明专利
    未知

    公开(公告)号:DE68915148D1

    公开(公告)日:1994-06-09

    申请号:DE68915148

    申请日:1989-02-17

    Applicant: TOSOH CORP

    Abstract: PCT No. PCT/JP89/00159 Sec. 371 Date Oct. 17, 1989 Sec. 102(e) Date Oct. 17, 1989 PCT Filed Feb. 17, 1989.A photoresist composition comprising: a resin soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; and a photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.

    7.
    发明专利
    未知

    公开(公告)号:DE3882217T2

    公开(公告)日:1993-11-11

    申请号:DE3882217

    申请日:1988-12-28

    Applicant: TOSOH CORP

    Abstract: An ultrafiltration membrane formed of a polyvinyl formal resin having a recurring unit represented by the general formula (I), and a process for producing this ultrafiltration membrane: wherein n is 550 to 950. o

    8.
    发明专利
    未知

    公开(公告)号:DE68915148T2

    公开(公告)日:1994-08-18

    申请号:DE68915148

    申请日:1989-02-17

    Applicant: TOSOH CORP

    Abstract: PCT No. PCT/JP89/00159 Sec. 371 Date Oct. 17, 1989 Sec. 102(e) Date Oct. 17, 1989 PCT Filed Feb. 17, 1989.A photoresist composition comprising: a resin soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; and a photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.

    9.
    发明专利
    未知

    公开(公告)号:DE3882217D1

    公开(公告)日:1993-08-12

    申请号:DE3882217

    申请日:1988-12-28

    Applicant: TOSOH CORP

    Abstract: An ultrafiltration membrane formed of a polyvinyl formal resin having a recurring unit represented by the general formula (I), and a process for producing this ultrafiltration membrane: wherein n is 550 to 950. o

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