公开(公告)号：EP0811579A3

公开(公告)日：1998-01-14

申请号：EP97112786.5

申请日：1994-03-04

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： Maarschalker-Weerd, Jan M.

IPC: C02F1/32 ,  A61L2/10 ,  B01J19/12

CPC classification number: B01J19/123 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  Y10S422/906

Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises:
a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning solution suitable to remove undesired materials from the portion of the radiation source.

Abstract translation: 本发明涉及一种用于流体处理系统中的辐射源组件的清洁设备。 本发明的特征在于，该清洁设备包括：清洁套筒，该辐射源与辐射源组件中的辐射源的外部的一部分接合，并且可以在以下两者之间移动：（i）缩回位置，其中辐射源的一部分暴露于 （ii）延伸位置，其中所述辐射源的所述部分被所述清洁套筒完全或部分覆盖，所述清洁套筒还包括与所述辐射源的所述部分接触的腔室，所述腔室 适于接收适于从辐射源的该部分移除不希望的材料的清洁溶液。

公开(公告)号：EP0811579A2

公开(公告)日：1997-12-10

申请号：EP97112786.5

申请日：1994-03-04

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： Maarschalker-Weerd, Jan M.

IPC: C02F1/32 ,  A61L2/10 ,  B01J19/12

CPC classification number: B01J19/123 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  Y10S422/906

Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system.
The invention is characterized in that the cleaning apparatus comprises:

a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve,
the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning solution suitable to remove undesired materials from the portion of the radiation source.

Abstract translation: 本发明涉及一种用于流体处理系统中的辐射源组件的清洁装置。 本发明的特征在于，清洁装置包括：清洁套筒，与辐射源组件中的辐射源的外部的一部分接合并可在以下位置之间移动：（i）缩回位置，其中辐射源的一部分暴露于 待处理的流体流动，以及（ii）延伸位置，其中辐射源的该部分被清洁套筒完全或部分地覆盖，清洁套筒还包括与辐射源的该部分相接触的室， 适于接收适于从所述辐射源的所述部分去除不需要的材料的清洁溶液。

公开(公告)号：EP0811579B1

公开(公告)日：2001-07-25

申请号：EP97112786.5

申请日：1994-03-04

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： Maarschalker-Weerd, Jan M.

IPC: C02F1/32 ,  A61L2/10 ,  B01J19/12

CPC classification number: B01J19/123 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  Y10S422/906

公开(公告)号：EP1094035B1

公开(公告)日：2003-08-20

申请号：EP01100934.7

申请日：1994-03-04

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： Maarschalker-Weerd, Jan M.

IPC: C02F1/32 ,  B01J19/12

CPC classification number: B01J19/123 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  Y10S422/906

公开(公告)号：EP1094035A3

公开(公告)日：2001-10-31

申请号：EP01100934.7

申请日：1994-03-04

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： Maarschalker-Weerd, Jan M.

IPC: C02F1/32 ,  B01J19/12

CPC classification number: B01J19/123 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  Y10S422/906

Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

公开(公告)号：EP1094035A2

公开(公告)日：2001-04-25

申请号：EP01100934.7

申请日：1994-03-04

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： Maarschalker-Weerd, Jan M.

IPC: C02F1/32 ,  B01J19/12

CPC classification number: B01J19/123 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  Y10S422/906

Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system.
The invention is characterized in that the cleaning apparatus comprises:

a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve,
the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

Abstract translation: 本发明涉及一种用于流体处理系统中的辐射源组件的清洁设备。 本发明的特征在于，该清洁设备包括：清洁套筒，该辐射源与辐射源组件中的辐射源的外部的一部分接合，并且可以在以下两者之间移动：（i）缩回位置，其中辐射源的一部分暴露于 （ii）延伸位置，其中所述辐射源的所述部分被所述清洁套筒完全或部分覆盖，所述清洁套筒还包括与所述辐射源的所述部分接触的腔室，所述腔室 适于接收清洁流体，所述清洁流体适于在清洁套筒移动时从辐射源的所述部分去除不期望的材料。