公开(公告)号：WO2004078640A1

公开(公告)日：2004-09-16

申请号：PCT/NL2004/000166

申请日：2004-03-05

Applicant: TECHNISCHE UNIVERSITEIT DELFT ,  STORM, Arnoldus, Jan ,  ZANDBERGEN, Hendrik, Willem

Inventor： STORM, Arnoldus, Jan ,  ZANDBERGEN, Hendrik, Willem

IPC: B81B1/00

CPC classification number: G01N33/48721 ,  B81B1/004 ,  B81B2203/0127 ,  B81C1/00087 ,  B81C2201/0143 ,  H01J37/31

Abstract: The invention relates to a method for manufacturing nanometer-scale apertures, wherein, in an object, in a conventional manner, at least one aperture is provided with a nanometer-scale surface area, after which, by means of an electron beam, energy is supplied to at least the edge of said at least one aperture, such that the surface area of the respective aperture is adjusted, wherein the surface area of the aperture is controlled during adjustment and the supply of energy is regulated on the basis of the surface area change.

Abstract translation: 本发明涉及一种制造纳米尺度孔径的方法，其中在一个目的中，以常规方式，至少一个开口具有纳米级的表面积，之后借助于电子束，能量是 供应到所述至少一个孔的至少边缘，使得调节相应孔的表面积，其中在调节期间控制孔的表面积，并且基于表面积调节能量供应 更改。

公开(公告)号：EP1599411A1

公开(公告)日：2005-11-30

申请号：EP04717903.1

申请日：2004-03-05

Applicant: Technische Universiteit Delft

Inventor： STORM, Arnoldus, Jan ,  ZANDBERGEN, Hendrik, Willem

IPC: B81B1/00

CPC classification number: G01N33/48721 ,  B81B1/004 ,  B81B2203/0127 ,  B81C1/00087 ,  B81C2201/0143 ,  H01J37/31

Abstract: The invention relates to a method for manufacturing nanometer-scale apertures, wherein, in an object, in a conventional manner, at least one aperture is provided with a nanometer-scale surface area, after which, by means of an electron beam, energy is supplied to at least the edge of said at least one aperture, such that the surface area of the respective aperture is adjusted, wherein the surface area of the aperture is controlled during adjustment and the supply of energy is regulated on the basis of the surface area change.