公开(公告)号：US20240061152A1

公开(公告)日：2024-02-22

申请号：US18234506

申请日：2023-08-16

Applicant: Thorlabs, Inc.

Inventor： Longfei YE ,  Ryan Joseph PRIORE ,  Bill DONOVAN ,  Alex CABLE

IPC: G02B1/111 ,  G02B1/118 ,  B05D3/14

CPC classification number: G02B1/111 ,  G02B1/118 ,  B05D3/148

Abstract: In a method of producing an anti-reflective surface, instead of etching subwavelength structures directly onto the substrate, a thin film layer of topcoat is deposited onto the surface of the substrate, and the anti-reflective surface is created by etching the structures into the topcoat. Because the thin film can be applied to substrates made of a large number of different materials, only common etching recipes need to be developed for a few thin film materials. The present method overcomes the shortcoming that existing methods of etching structures directly on a substrate would require a different etching recipe for each substrate made of a different material.