公开(公告)号：JP2006008452A

公开(公告)日：2006-01-12

申请号：JP2004188510

申请日：2004-06-25

Applicant: Tohos Sgm Kk ,  東ソ−・エスジ−エム株式会社

Inventor： KAMO KENJI ,  MITARAI KAZUHARU ,  YOSHIDA NAOKI

IPC: C03B20/00 ,  C03B19/01

CPC classification number: C03B19/01

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method for highly pure quartz glass which is excellent in ultraviolet transmission, emits no fluorescence when exposed to ultraviolet radiation and contains extremely few bubbles.
SOLUTION: In this manufacturing method for the highly pure quartz glass, an amorphous silica powder is heated and melted in oxyhydrogen flame and deposited in a furnace. The amorphous silica powder contains Ti, Na, K and Li each independently in an amount of ≤0.5 ppm. Fire bricks that compose the furnace and contact the deposited quartz glass contain Ti, Na, K and Li each independently in an amount of ≤0.5 wt.%. The quartz glass contains Ti, Na, K and Li each independently in an amount of ≤0.5 ppm.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种紫外线透射性优异的高纯度石英玻璃的制造方法，当暴露于紫外线并且含有极少的气泡时，不发出荧光。 解决方案：在这种高纯石英玻璃的制造方法中，将无定形二氧化硅粉末在氢氧焰中加热熔化并沉积在炉中。 无定形二氧化硅粉末分别独立地含有≤0.5ppm的Ti，Na，K和Li。 组成炉并与沉积的石英玻璃接触的防火砖各自独立地含有≤0.5重量％的Ti，Na，K和Li。 石英玻璃含有Ti，Na，K和Li各自独立地为≤0.5ppm。 版权所有（C）2006，JPO＆NCIPI