PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    公开(公告)号:US20250149309A1

    公开(公告)日:2025-05-08

    申请号:US19018319

    申请日:2025-01-13

    Abstract: A plasma processing apparatus disclosed herein includes a chamber, a substrate support, a plasma generator, at least one electromagnet, and a power source. The substrate support is provided in the chamber. The substrate support includes a first region on which a substrate is placeable and a second region which surrounds the first region and on which an edge ring is placed. The plasma generator is configured to generate a plasma in the chamber. The at least one electromagnet is configured to generate a magnetic field localized in an annular space above the edge ring. The power source is electrically connected to the at least one electromagnet and is configured to adjust a strength of the magnetic field.

    ANTENNA DEVICE, RADIATION METHOD OF ELECTROMAGNETIC WAVES, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD

    公开(公告)号:US20200075292A1

    公开(公告)日:2020-03-05

    申请号:US16552372

    申请日:2019-08-27

    Abstract: In one exemplary embodiment, a second waveguide is connected to an upper wall of a first waveguide and communicates with the first waveguide, a dielectric window is in contact with a lower wall of the first waveguide, a first inner conductor penetrates an upper wall, is electrically connected with the upper wall, and extends along the direction of a tube axis from an inside of the first waveguide to an inside of a third waveguide, the third waveguide is connected to the lower wall on the dielectric window side and communicates with the first waveguide, a first opening end of the third waveguide is connected to the dielectric window, and a drive device is connected to the first inner conductor, and is configured to drive the first inner conductor in the direction of the tube axis.

    ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20190279845A1

    公开(公告)日:2019-09-12

    申请号:US16298307

    申请日:2019-03-11

    Abstract: An antenna device according to an exemplary embodiment radiates electromagnetic waves. In the antenna device, a dielectric window is in contact with a lower wall of a first waveguide, the first waveguide is provided between the dielectric window and a second waveguide and extends in a direction crossing a tube axis of the second waveguide, a dispersion part in the first waveguide disperses the electromagnetic wave in the first waveguide, a coaxial conversion part causes propagation of the electromagnetic waves dispersed by the dispersion part to direct to a side of the dielectric window, and a front surface of the dielectric window does not have irregularities.

    PLASMA PROCESSING APPARATUS
    5.
    发明申请

    公开(公告)号:US20220399191A1

    公开(公告)日:2022-12-15

    申请号:US17835251

    申请日:2022-06-08

    Abstract: There is provided a plasma processing apparatus comprising: a plasma processing chamber having an upper wall, a sidewall, and a lower wall and having therein a plasma processing space; and a magnetic shield disposed around an outer side of the sidewall and having an opening at an upper side thereof. On the assumption that an angle between a line that passes through a midpoint of an inner surface of the upper wall on the plasma processing space side and connects end points of the opening and the inner surface is θ[°] and a product μi×t of an initial relative permeability pi of a magnetic material forming the magnetic shield and a thickness t[m] of the magnetic shield is Pmc[m], the angle θ[°] satisfies a condition θ>764×Pmc−2+179×Pmc−1+21.3.

    ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

    公开(公告)号:US20200058468A1

    公开(公告)日:2020-02-20

    申请号:US16478770

    申请日:2018-01-04

    Abstract: An antenna according to an aspect includes: a dielectric window having a first surface and a second surface, the second surface having an annular recessed surface and a flat surface surrounded by the recessed surface; a slot plate; a dielectric plate; a heat transfer member made of metal and having an upper surface and a lower surface opposing each other; a cooling jacket; and a heater, in which the upper surface includes a plurality of first regions and a second region, the cooling jacket is mounted on the plurality of first regions, the second region is recessed further toward the lower surface side than the plurality of first regions, the heater is mounted on the second region, and each of the plurality of first regions is provided at a position at least partially overlapping with the flat surface when viewed in a direction parallel to a central axis.

    SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM, AND PLASMA ETCHING METHOD

    公开(公告)号:US20220270862A1

    公开(公告)日:2022-08-25

    申请号:US17668429

    申请日:2022-02-10

    Abstract: There is a substrate support for use in a plasma processing apparatus, the substrate support comprising: a base; a ceramic plate disposed on the base, the ceramic plate having a substrate supporting region and a ring supporting region surrounding the substrate supporting region; an insulating annular member disposed around the base and the ceramic plate; a fixed edge ring having an inner portion and an outer portion, the inner portion being supported on the ring supporting region, the outer portion being supported on the insulating annular member, the outer portion having a first width; a movable edge ring disposed above the outer portion of the fixed edge ring, the movable edge ring having a second width smaller than the first width; and an actuator configured to vertically move the movable edge ring with respect to the fixed edge ring.

    ANTENNA DEVICE AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20190333736A1

    公开(公告)日:2019-10-31

    申请号:US16394190

    申请日:2019-04-25

    Abstract: An antenna device according to an exemplary embodiment radiates electromagnetic waves. In the antenna device, a dielectric window is in contact with a lower wall of a first waveguide, the first waveguide is provided between the dielectric window and a second waveguide and extends in a direction crossing a tube axis of the second waveguide, a dispersion part in the first waveguide disperses the electromagnetic waves in the first waveguide, two inner conductors disposed at different distances from the tube axis and connected to the dielectric window include coaxial conversion parts which cause propagation of the electromagnetic waves dispersed by the dispersion part to direct to the dielectric window side, a body length of the inner conductor most distant from the tube axis, out of body lengths of the two inner conductors, is longer, and a front surface of the dielectric window does not have irregularities.

    MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20190267216A1

    公开(公告)日:2019-08-29

    申请号:US16342766

    申请日:2017-10-04

    Abstract: In a microwave output device of an embodiment, a part of travelling wave propagating from a microwave generation unit to an output are output from a directional coupler. A first measurement unit generates an analog signal corresponding to a power of the part of the travelling wave by using diode detection, and converts the analog signal into a digital value. One or more correction coefficients associated with a set frequency and a set power of a microwave designated for the microwave output device are selected. The selected one or more correction coefficients are multiplied by the digital value, and thus a measured value is determined.

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