Manufacturing method of shadow mask
    1.
    发明专利
    Manufacturing method of shadow mask 审中-公开
    阴影掩模的制造方法

    公开(公告)号:JP2006019114A

    公开(公告)日:2006-01-19

    申请号:JP2004195274

    申请日:2004-07-01

    Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a shadow mask which cuts the shadow mask in a wafer-like shape without using a cutting machine constituted of a stationary blade and a moving blade when the shadow mask of which the many sides are attached to a lengthy belt-shaped metal sheet is cut into the wafer-like shape.
    SOLUTION: The metal sheet is cut by irradiating a laser beam while moving a laser beam source 30 installed above the metal sheet 1 in the width direction Y of the metal sheet. The metal sheet is cut in the lengthy belt-shaped direction of the metal sheet while the transfer of the laser beam source is made in the lengthy belt-shaped direction X of the metal sheet. The laser beam source should be YAG or CO
    2 laser.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种荫罩的制造方法,该荫罩在不使用由固定刀片和动叶片构成的切割机的情况下切割为荫罩状的荫罩, 侧面附着在长条状的带状金属片上,被切成晶片状。 解决方案:通过在金属片的宽度方向Y上移动安装在金属片1上方的激光源30移动激光束来切割金属片。 在金属片的长度方向的带状方向上切割金属片,同时在金属片的长度方向X上形成激光束源的传送。 激光束源应为YAG或CO 2 激光。 版权所有(C)2006,JPO&NCIPI

    ANNEAL PROCESSING METHOD OF SHADOW MASK
    2.
    发明专利

    公开(公告)号:JP2003132785A

    公开(公告)日:2003-05-09

    申请号:JP2001327730

    申请日:2001-10-25

    Abstract: PROBLEM TO BE SOLVED: To provide an anneal processing method of a shadow mask, which uses a high-strength material as the material of the shadow mask, and even if the anneal processing is carried out in a continuation furnace performs in a state where the shadow masks have been piled with, uneven discoloration can not be generated on the surface of the skirt part of the shadow mask, and also, uneven black color can not be generated in a blacking processing. SOLUTION: When the anneal processing is carried out with piling up the shadow masks, the anneal processing is carried out after making the circumference edge of the skirt part of the shadow mask 21 have waves so that reduction gas may fully flow in between the skirt parts 23 of the piled shadow masks.

    PRESSER PLATE FOR PACKING ETCHED COMPONENT AND METHOD OF PACKING ETCHED COMPONENT USING THE SAME

    公开(公告)号:JP2003112770A

    公开(公告)日:2003-04-18

    申请号:JP2001306093

    申请日:2001-10-02

    Abstract: PROBLEM TO BE SOLVED: To suppress generation of foreign matters due to abrasion, impact or the like during handling such as transportation and storage and generation of foreign matters by friction of a polypropylene band, to prevent a peripheral portion of an etched component from bending, and to reduce failures of the component by using a presser plate for packing the etched component. SOLUTION: Two plastic corrugated board sheets are stuck, and rib directions of the two sheets 54a and 54b are orthogonal to each other. The component is tied with a band and packed with a lower presser plate and an upper presser plate disposed so that a rib direction of an upper layer 61a of the lower presser plate is in parallel to a rib direction of an upper layer 62a of the upper presser plate.

Patent Agency Ranking