Patent search ap:("UCB SA") AND inv:"BURANKUKEN OUGASUTO" Page 1

1.

发明专利
FORMATION OF POSITIVE PATTERN IN PHOTORESIST LAYER 失效

公开(公告)号：JPS6324248A

公开(公告)日：1988-02-01

申请号：JP11165887

申请日：1987-05-07

Applicant: UCB SA

Inventor： RORANDO BURUNO , BURANKUKEN OUGASUTO

IPC: G03F7/008 , G03F7/26 , G03F7/30 , G03F7/36

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